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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 黃光裕(Kuang-Yuh Huang) | |
| dc.contributor.author | Chung-Hsiang Cheng | en |
| dc.contributor.author | 鄭仲翔 | zh_TW |
| dc.date.accessioned | 2021-06-07T17:32:51Z | - |
| dc.date.copyright | 2020-07-17 | |
| dc.date.issued | 2020 | |
| dc.date.submitted | 2020-07-06 | |
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/15320 | - |
| dc.description.abstract | 原子力顯微鏡(Atomic Force Microscope, AFM)應用領域含括奈米量測、材料科學與生醫工程等。現今，AFM更朝檢測環境控制或動態檢測發展，如：水溶液環境、超高真空或即時動態觀測。因此，AFM一直是學術研發的重點項目之一。 新型離焦式原子力顯微鏡(Defocus Atomic Force Microscope, DeF-AFM)係利用光碟機讀取頭(Optical Pick-up Unit, OPU)作為開發核心元件，大幅提升系統穩定性與可靠度。運用光碟機讀取頭內部雷射搭配光學透鏡與光檢測器(Photodiode IC, PDIC)，建構高斯光束(Gaussian beam)縱向強度量測系統，再藉由解析入射懸臂之匯聚光束於光軸上的指數強度變化量，獲得懸臂位移。高斯光束縱向量測機制具有兩區域線性量測範圍並對稱於焦點且各為8 μm。不同於以往光學量測系統操作之焦點位置，本系統於量測時僅需操作於其中一區域，因此構成本文之離焦式原子力顯微鏡。 光學量測系統性能取決於量測光源的穩定程度，因此本研究進行雷射波長飄移對離焦式量測系統的影響分析與討論。利用光譜儀測得本研究使用之光碟機讀取頭的雷射波長飄移量為1.7 nm，同調長度為179.1 μm。上述數值會造成匯聚光位置偏移302.6 nm。而本系統架構下的線性量測範圍為8 μm，因此操作於輕敲式(Tapping mode)下，將可免於匯聚光位置偏移影響。此外，雷射之同調長度遠大於線性量測範圍，因此於垂直式光路下之光學干涉現象將無可避免。 本研究亦設計DeF-AFM之配套控制器，XYZ三軸動態量測範圍可達13410.9 nm、12714.9 nm與1400 nm，並分別具備橫向解析度為3.3 nm與3.1 nm以及縱向解析能力為0.34 nm。經實驗結果證實，本論文所發展之新型離焦式原子力顯微鏡DeF-AFM具有獲得石墨單層原子台階之解析能力。 | zh_TW |
| dc.description.abstract | The application fields of Atomic Force Microscope including the nano-measurement, material science, and biomedical engineering, etc. Nowadays, the development of the AFM towards inspection environment control or dynamic detection such as in the solution environment, in the ultra-high vacuum, or the real-time observation. Therefore, AFM is always one of the crucial items in academic study. This novel AFM is named Defocus Atomic Force Microscope (DeF-AFM), which applies the optical pick-up unit (OPU) as the core component, dramatically improves the stability and the reliability of the system. A Gaussian beam intensity measuring system is built by the laser diode, the optical lens, and the photodiode IC (PDIC) inside the OPU. The displacement of the cantilever is acquired through analyzing the exponential intensity change along the optic axis focusing on the cantilever. There are two sections of the linear measuring region, which are bilateral symmetry from the focus with 8 μm range, in this Gaussian beam intensity measuring mechanism. Different from the focus position in the traditional optical measuring system, this measuring mechanism needs only one section of the linear measuring region. Therefore, the Def-AFM in this dissertation is constructed. The performance of the optical measuring system depends on the stability of the light source. Therefore, the influence of the wavelength drift of the laser is analyzed and discussed in this study. The values of the wavelength drift and the coherent length are measured by a spectrometer to be 1.7 nm and 179.1 μm, respectively. The position of the focused laser will then be deviated about 302.6 nm by the values. However, the linear measuring range is 8 μm in this system, therefore, the deviation won’t be affected under operating in the tapping mode. Besides, the interference of the vertical optical path will be inevitable, because the coherent length is greater than the linear measuring range. The support controller for the DeF-AFM is also designed and manufactured in this study. The dynamic measuring ranges in X, Y, and Z-axis are 13410.9 nm, 12714.9 nm, and 1400 nm with the horizontal resolution of 3.3 nm, 3.1 nm, and the vertical resolution 0.34 nm, respectively. The resolving ability of this new type of DeF-AFM is verified by resolving the single atomic step on the highly ordered pyrolytic graphite (HOPG). | en |
| dc.description.provenance | Made available in DSpace on 2021-06-07T17:32:51Z (GMT). No. of bitstreams: 1 U0001-0407202015193300.pdf: 16213063 bytes, checksum: db4514a48e94b79043b0b9aa163ad426 (MD5) Previous issue date: 2020 | en |
| dc.description.tableofcontents | 致謝 i 摘要 ii Abstract iii 目錄 v 圖目錄 viii 表目錄 xiii 符號說明 xiv 第一章 緒論 1 1.1 研究背景與動機 1 1.2 研究目的 4 1.3 文獻回顧 5 1.3.1 SPM發展過程與趨勢 5 1.3.2 原子力顯微鏡原理 14 1.3.3 光碟機讀取頭(Optical Pick-up Unit, OPU)應用於原子力顯微鏡 20 1.3.4 原子力顯微鏡之懸臂量測機制發展回顧與比較 29 1.4 論文架構 30 第二章 量測系統之基礎理論 32 2.1 高斯光束(Gaussian beam) 32 2.1.1 高斯光束之橫向強度分佈 33 2.1.2 聚焦光斑尺寸與景深 35 2.1.3 高斯光束之縱向量測原理 37 2.2 光碟機讀取頭光路架構與偵測原理 40 2.3 離焦式原子力顯微鏡DeF-AFM系統簡介 43 第三章 離焦式原子力顯微鏡DeF-AFM之量測模組設計分析 45 3.1 高斯光束之縱向量測法應用於離焦式原子力顯微鏡之架構 45 3.2 高斯光束縱向量測法光路之模擬分析 47 3.2.1 入射光匯聚現象對靈敏度之影響 50 3.2.2 量測訊號動態量測範圍分析探討 52 3.2.3 高斯光束之變化對光檢測器PDIC之量測光斑影響與分析探討 56 3.2.4 波長飄移對量測誤差之影響 60 3.2.5 光檢測器PDIC之複合高斯縱向訊號對量測性能之影響 63 3.3 高斯光束縱向量測模組之設計與開發 67 第四章 控制器設計及其量測與系統致動性能分析探討 68 4.1 量測模組電路設計與性能分析 68 4.1.1 光學干涉現象與高頻調製電路C_HFM 70 4.1.2 高速光檢測器PDIC之驅動電路C_PDICD 70 4.2 雷射驅動與高壓傳輸電路設計與性能分析 72 4.2.1 雷射自動功率控制電路C_APC 74 4.2.2 高斯訊號處理電路C_GSP 75 4.2.3 下針模組極限位置偵測電路C_LPD 76 4.3 DeF-AFM主控制器設計 78 4.3.1 音圈馬達控制與驅動電路C_VCMD 81 4.3.2 輕敲模式振幅計算電路C_TMC與非輕敲模式訊號處理電路C_NTMC 84 4.3.3 電源供應轉換電路C_PSC 89 4.3.4 三軸撓性壓電致動器與壓電驅動電路C_PZD 91 4.3.5 懸臂激振電路C_ESG 93 4.3.6 下針模組驅動電路C_SMD 95 4.3.7 量測訊號擷取裝置 96 第五章 離焦式原子力顯微鏡DeF-AFM性能驗證 97 5.1 DeF-AFM之橫向解析能力驗證 97 5.2 DeF-AFM之縱向解析能力驗證 101 5.2.1 形貌回饋致動性能之驗證 101 5.2.2 DeF-AFM量測靈敏度之測試 102 5.3 DeF-AFM系統之掃描量測性能驗證 105 第六章 結論與未來展望 108 6.1 結論 108 6.2 未來展望 111 參考文獻 114 附錄 121 | |
| dc.language.iso | zh-TW | |
| dc.subject | 原子台階 | zh_TW |
| dc.subject | 原子力顯微鏡 | zh_TW |
| dc.subject | 離焦式 | zh_TW |
| dc.subject | 雷射二極體 | zh_TW |
| dc.subject | 高斯光束 | zh_TW |
| dc.subject | 縱向量測 | zh_TW |
| dc.subject | 光碟機讀取頭 | zh_TW |
| dc.subject | Defocus | en |
| dc.subject | Atomic Step | en |
| dc.subject | Optical Pick-up Unit | en |
| dc.subject | Axial Intensity Measuring | en |
| dc.subject | Gaussian Beam | en |
| dc.subject | Laser Diode | en |
| dc.subject | Atomic Force Microscope | en |
| dc.title | 高斯光束縱向解析原理應用於新型離焦式原子力顯微鏡之研發 | zh_TW |
| dc.title | Axial Intensity Measuring Principle of Gaussian Beam for Developing a Novel Defocus Atomic Force Microscope | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 108-2 | |
| dc.description.degree | 博士 | |
| dc.contributor.oralexamcommittee | 廖先順(Hsien-Shun Liao),張若軒(Jo-Hsuan Chang),楊志文(Chih-Wen Yang),莊博景(Bo-Jing juang) | |
| dc.subject.keyword | 原子力顯微鏡,離焦式,雷射二極體,高斯光束,縱向量測,光碟機讀取頭,原子台階, | zh_TW |
| dc.subject.keyword | Atomic Force Microscope,Defocus,Laser Diode,Gaussian Beam,Axial Intensity Measuring,Optical Pick-up Unit,Atomic Step, | en |
| dc.relation.page | 125 | |
| dc.identifier.doi | 10.6342/NTU202001312 | |
| dc.rights.note | 未授權 | |
| dc.date.accepted | 2020-07-07 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 機械工程學研究所 | zh_TW |
| 顯示於系所單位： | 機械工程學系 | |
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