曲面透明顯示器背景影像繞射抑制之研究

Abstract

在透明顯示領域中，表面異質結構經常會在成像系統中引發繞射，從而破壞背景影像的清晰度。本研究針對曲面透明顯示器因異質結構引起的繞射效應，提出了一套完整的理論模型與解決方案，旨在改善背景影像的品質，並實現透明顯示技術的進一步應用。透過建立三維電極結構建模流程，結合逆向傳播相位檢索演算法與模擬退火演算法，成功設計出繞射光學元件（DOE）以抑制高階繞射。模擬結果顯示，評價函數經過數萬次迭代後達到目標分布的 99%，零階繞射能量比例從 42.261% 提升至 65.752%，二階繞射光斑能量平均降低 5.825%。此外，本研究將多相位角度擾動進行了向量化計算，成功提升演算法效率，實現了大規模數據的高效處理。 在模擬實驗結果中，進一步驗證了繞射光學元件在曲面透明顯示器上的應用效果，成功改善空間頻率響應（SFR），特別是在中高頻區域顯著提高影像品質。本研究所提出的技術不僅可用於透明顯示器設計，也具備在半導體製造中解決因透明異質結構而產生的離軸繞射問題的潛力。未來工作將著重於優化演算法效率，提升元件製造相容性，並探索車用顯示與 AR/VR 系統中的應用，推動透明顯示與光學製造技術的創新發展。

In the field of transparent displays, surface heterostructures often induce diffraction in imaging systems, disrupting the clarity of background images. This study addresses the diffraction effects caused by heterostructures in curved transparent displays by proposing a comprehensive theoretical model and solution aimed at improving background image quality and advancing the application of transparent display technology. By establishing a 3D photomask modeling process and integrating inverse propagation phase retrieval with a simulated annealing algorithm, diffractive optical elements (DOEs) were successfully designed to suppress high-order diffraction. Simulation results showed that the evaluation function converged to 99% of the target distribution after tens of thousands of iterations, with the zero-order diffraction energy ratio increasing from 42.261% to 65.752% and second-order diffraction spot energy decreasing by an average of 5.825%. Furthermore, this study employed vectorized computation for multi-phase perturbation calculations, significantly enhancing algorithm efficiency and enabling the effective processing of large-scale data. Simulation experiments further validated the application of DOEs in curved transparent displays, demonstrating improved spatial frequency response (SFR), particularly in the mid-to-high-frequency range, resulting in significantly enhanced image quality. The proposed technology is not only applicable to transparent display design but also shows potential for addressing off-axis diffraction issues caused by transparent heterostructures in semiconductor manufacturing. Future work will focus on optimizing algorithm efficiency, improving component manufacturing compatibility, and exploring applications in automotive displays and AR/VR systems, driving innovation in transparent display and optical manufacturing technologies.