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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 林新智 | zh_TW |
dc.contributor.advisor | Hsin-Chih Lin | en |
dc.contributor.author | 吳尚澂 | zh_TW |
dc.contributor.author | Shang-Cheng Wu | en |
dc.date.accessioned | 2024-02-22T16:42:32Z | - |
dc.date.available | 2024-02-23 | - |
dc.date.copyright | 2024-02-22 | - |
dc.date.issued | 2024 | - |
dc.date.submitted | 2024-01-31 | - |
dc.identifier.citation | 1. M.H. Tsai, J.W. Yeh, "High-Entropy Alloys: A Critical Review." Mater. Res. Lett., (2014): 107-123.
2. Y.F. Ye, Q. Wang, J. Lu, C.T. Liu, Y. Yang, "High-entropy ally: challenges and prospects." Materials Today, (2016):349-361. 3. J.W. Yeh, "Alloy design strategies and future trends in high-entropy alloys." The Minerals, Metals & Materials Society, (2013):1759-1771. 4. B. Gludovatz, A. Hohenwarter, K.V. Thurston, H. Bei, Z. Wu, E.P. George, R.O. Ritchiej, "Exceptional damage-tolerance of a medium-entropy alloy CrCoNi at cryogenic temperatures." Nat. Commun., (2016). 5. S. Youshida, T. Bhattacharjee, Y. Bai, N. Tsuji, ". Friction stress and Hall-Petch relationship in CoCrNi equi-atomic medium entropy alloy processed by severe plastic deformation and subsequent annealing." Scr. Mater., (2017):33-36. 6. J.W. Bae, J. Moon, M.J. Jang, D. Yim, D. Kim, S. Lee, H.S. Kim, "Trade-off between tensile property and formability by partial recrystallization of CrMnFeCoNi high-entropy alloy" Mater. Sci. Eng. A, (2017):324-330. 7. S.J. Sun, Y. Z. Tian, H.R. Lin, X.G. Dong, Y.H. Wang, Z.J. Zhang, Z.F. Zhang, "Enhanced strength and ductility of bulk CoCrFeMnNi high entropy alloy having fully recrystallized ultrafine-grained structure." Mater. Des., (2017):122-127. 8. W. Lu, X. Luo, Y. Yang, B. Huang, "Effects of Nb additions on structure and mechanical properties evolution of CoCrNi medium-entropy alloy." Mater. Express, (2019):291-298. 9. Z. Wu, W. Guo, K. Jin, J.D. Poplawsky, Y. Gao, H. Bei, "Enhanced strength and ductility of a tungsten-doped CoCrNi medium-entropy alloy." J. Mater. Res., (2018):1-9. 10. H. Yi, M. Bi, K. Yang, B. Zhang, "Significant Improvement the Mechanical Properties of CoCrNi Alloy by Tailoring a Dual FCC-Phase Structure." Materials, (2020):1-7. 11. A.K. Bhargava, M.K. Banerjee, "Heat-treating copper and nickel alloys." Comprehensive Materials Finishing, (2017):398-420. 12. E.P. DeGarmo, J.T. Black, R.A. Kohser, " Materials and process in manufacturing ninth edition." John Wiley & Sons, (2003). 13. P. Kusakin, A. Belyakov, C. Haase, R. Kaibyshev, D.A. Molodov, "Microstructure evolution and strengthening mechanisms of Fe–23Mn–0.3C–1.5Al TWIP steel during cold rolling." Material Science & Engineering A, (2014):52-60. 14. 黃振賢, "金屬熱處理第十八版." 新文京, (2014) 15. Hu, Hsun, "Recovery and recrystallization of metals." AIME Conf. Series, Interscience Publisher, N.Y., (1963):311-362. 16. Raabe, Dierk, "Recovery and recrystallization: Phenomenon physic, models, simulation. " Physical Metallurgy, Fifth Edition, Elsevier, (2014) 17. R.W. Cahn, "Recovery and recrystallization." R.W. Cahn & P. Haasen Eds., Physical Metallurgy, Forth edition, Elsevier Science B.V., (1996) 18. J.C.M. Li, "Possibility on subgrain rotation during recrystallization." Journal of Applied Physics, (1962). 19. E.J. Mittemeijer, "Fundamentals of materials science." Springer-Verlog, (2010). 20. T. Sakai, A. Belyakov, R. Kaibyshev, H. Miura, J.J. Jonas, "Dynamic and post-dynamic recrystallization under hot, cold and severe plastic deformation conditions." Progress in Materials Science, (2014):130-207. 21. Assmus, F., K. Defert and G. lbe, Zeitsch Metallkunde, Vol. 48, 344 (1967) 22. R.W. Cahn, "Recovery and recrystallization in physical metallurgy." Ed.R.W. Cahn, North Holland Publisher Company, (1970). 23. R.A. Andrievski, A.V. Khatchoyan, "Nanomaterials in extreme environments fundamentals and applications." Springer Series in Materials Science, (2016). 24. E.J. Mittemeijer, "Fundamentals of materials science." Springer-Verlog, (2010). 25. A. Baptista, F. Silva, J. Porteiro, J. Miguez, G. Pinto, "Sputtering physical vapor deposition (PVD) coatings: A critical review on process improvement and market trend demands." Coatings, (2018). 26. M. Urbina et.al, "The metheologies and strategies for the development of novel material systems and coatings for applications in extreme environment: A critical review." Manufacturing Rev., (2018). 27. H. Soonmin, S.A. Vanalakar, A. Galal, V.N. Singh, "A review of nanostructured thin films for gas sensing and corrosion protection." Mediterranean Journal of Chemistry, (2019):433-451. 28. P.A. Savale, "Physical Vapor Deposition (PVD) methods for synthesis of thin film: A comparative study." Archives of Applied Science Research, (2016):1-8. 29. M.C. Lovell, A.J. Avery, M.W. Vernon, "Physical properties of materials." Van Nostrand Reinhold, (1976) 30. M.N. Chaudhari, R.B. Ahirrao, S.D. Baugl, "Thin film deposition methods: A critical review." International Journal for Research in Applied Science & Engineering Technology, (2021):5215-5232. 31. Westwood, William D., "Sputtering Deposition." AVS Education Committee Book Series, (2003). 32. M.N.R. Ashfold, F. Claeyssens, G.M. Fuge, S.J. Henley, "Pulsed laser ablation and deposition of thin films." Chem. Soc. Rev., (2004):23-31. 33. L. Lynds, B.R. Weinberger, D.M. Potrepka, G.G. Peterson, M.P. Lindsay, "High temperature superconducting thin films: The physics of pulsed laser ablation." Advance Deposition Techniques for Thin Film and Coatings, (1989):61-69. 34. R.E. Russo, X. Mao, J.J. Gonzalez, V. Zorba, J. Yoo, "Laser ablation in analytical chemistry." Anal. Chem., (2013):6162-6177. 35. T.J. Geyer, W.A. Weimer, "Parametric effects on plasma emission produced during excimer laser ablation of YBa2Cu3O7-x." Appl. Spectros., (1990):1659-1664. 36. B.P. Kafle, "Chapter 6- Introduction to nanomaterials and application of UV-visible spectroscopy for their characterization." Chemical Analysis and Material Characterization by Spectrophotometry, (2020): 147-198. 37. S. Parmar, A. Biswas, S.K. Singh, B. Ray, S. Parmar, S. Gosavi, V. Sathe, R.J. Choudhary, S. Datar, S. Ogale, "Coexisting 1T/2H polymorphs, reentrant resistivity behavior, and charge distribution in MoS2-hBN 2D/2D composite thin film." Physical Review Materials, (2019):1-9. 38. K. Brondum, "Decorative and functional finishes by low temperature arc vapor deposition." Vapor Technologies, Inc., (2005):596-604. 39. K. Wasa, I. Kanno, H. Kotera, "Handbook of sputter deposition technology: Fundamentals and applications for functional thin films, nanomaterials, and MEMS." Elsevier, (2012). 40. S. Swann, "Magnetron Sputtering." Physics in Technology, (1988):67-75. 41. P.J. Kelly, R.D. Arnell, "Magnetron sputtering: a review of recent developments and applications." Vacuum, (2000):159-172. 42. A.A Talab, A. Yahia, M.A. Saudy, M. Elsayed, "Characterization of a new DC-glow discharge plasma set-up to enhance the electronic circuits performance." Journal of Modern Physics, (2020):1044-1057. 43. M.M. Abdelrahman, "Study of plasma and ion beam sputtering processes." Journal of Physical Science and Application, (2015):128-142. 44. P. Asanithi, S. Chaiyakun, P. Limsuwan, "Growth of silver nanoparticles by DC magnetron sputtering." Journal of Nanomaterials, (2012):1-8. 45. B. Chapman, "Glow Discharge Processes." John Wiley & Sons, (1980):45-47. 46. G.H. Gilmer, "Handbook of Crystal Growth." Vol. 1., D. T.J. Hurle, Ed., Elsevier, (1993):43-45. 47. K.A. Lozovoy, A.G. Korotaev, A.P. Kokhanenko, V.V. Dirko, A.V. Voitsekhovskii, "Kinetics of epitaxial formation of nanostructures by Frank-van der Merwe, Volmer-Weber and Stranski-Krastanow growth modes." Surface & Coatings Technology, (2020):1-28. 48. Y. Wang, W. Chen, B. Wang, Y. Zheng, "Ultrahigh ferroelectric films: growth, characterization, physics and applications." Materials, (2014):6377-6485. 49. I. Milosev, H.H. Strehblow, B. Navinsek, "Comparison of TiN, ZrN and CrN hard nitride coatings: Electrochemical and thermal oxidation." Thin Solid Films, (1997):246-254. 50. B. Navinsek, P. Panjan, I. Milosev, "Industrial applications of CrN (PVD) coatings, deposited at high and low temperatures." Surface and Coatings Technology, (1997):182-191. | - |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/91783 | - |
dc.description.abstract | 由多元主元素形成的高熵合金和中熵合金在近年來因擁有出色的綜合機械性能如高抗拉強度、高韌性以及優異的高溫強度等而引起了廣泛的關注,在這其中系中熵合金無疑是最吸睛的合金,因其除了高溫外,在低、中溫範圍內也有其他合金無法比擬的卓越性能,而添加了Si的CoCrNiSi_0.15中熵合金能解決CoCrNi合金降伏強度較低的缺點。
為了進一步提升CoCrNiSi_0.15中熵合金的使用壽命,本實驗利用射頻磁控濺鍍法沉積CrN薄膜於其表面,改變濺鍍時的氣體比例與濺鍍功率,並透過顯微組織的觀察、磨耗試驗來檢驗CrN薄膜沉積於CoCrNiSi_0.15表面對其抗磨耗性能的影響,並試圖找出最佳之濺鍍參數。 經由實驗發現沉積柱狀晶之CrN薄膜於CoCrNiSi_0.15中熵合金表面確實能提升其抗磨耗性能,且越厚的鍍層表現出越優異的抗磨耗性,在2N荷重下進行4000圈的磨耗試驗中,沉積CrN薄膜的CoCrNiSi_0.15磨耗率最高可減少98%。 | zh_TW |
dc.description.abstract | In recent years, high-entropy alloys (HEAs) and medium-entropy alloys (MEAs) composed of multi-principal elements have attracted widespread attention due to their outstanding mechanical properties, including high tensile strength, high ductility, and excellent high-temperature strength. Among these, medium-entropy alloys, especially those with a single face-centered cubic (FCC) phase like CoCrNi alloy, have shown exceptional performance at both cryogenic and medium temperatures compared to other MEAs and conventional alloys. Similar to other FCC-structured MEA alloys, CoCrNi alloy exhibits lower yield strength, prompting research on increasing its yield strength.
To further enhance the lifespan of CoCrNiSi_0.15 medium-entropy alloy, this study employs radio frequency magnetron sputtering to deposit CrN thin films on its surface. By varying the gas ratio and sputtering power during deposition, the impact of CrN film deposition on the wear resistance of CoCrNiSi_0.15 is examined through microstructural observations and wear tests. The goal is to identify the optimal sputtering parameters. Experimental results indicate that the deposition of columnar crystal CrN films on the surface of CoCrNiSi_0.15 medium-entropy alloy indeed improves its wear resistance. In a wear test conducted under a 2N load for 4000 cycles, the wear rate of CoCrNiSi_0.15 with deposited CrN film can be reduced by up to 98%. | en |
dc.description.provenance | Submitted by admin ntu (admin@lib.ntu.edu.tw) on 2024-02-22T16:42:32Z No. of bitstreams: 0 | en |
dc.description.provenance | Made available in DSpace on 2024-02-22T16:42:32Z (GMT). No. of bitstreams: 0 | en |
dc.description.tableofcontents | 致謝 I
摘要 II Abstract III 目次 IV 圖次 VI 表次 IX 第一章 前言 1 第二章 文獻回顧 2 2.1 高熵合金 2 2.1.1 高熵合金核心效應 2 2.1.2 Co-Cr-Ni中熵合金 3 2.2 熱處理 5 2.2.1 均質化處理 5 2.2.2 滾軋 5 2.2.3 退火 6 2.3 物理氣相沉積技術 (Physical Vapor Deposition, PVD) 11 2.3.1 物理氣相沉積原理與應用 11 2.3.2 物理氣相沉積技術分類 11 2.3.3 磁控濺鍍系統 15 2.3.4 直流磁控濺鍍系統 17 2.3.5 射頻磁控濺鍍系統 19 2.3.6 薄膜沉積機制 20 2.4 氮化鉻鍍層 23 2.4.1 氮化鉻鍍層之性質 23 2.4.2 氮化鉻鍍層之應用 23 第三章 實驗方法 26 3.1 實驗流程 26 3.2 試片製備 27 3.3 射頻磁控濺鍍CrN薄膜 31 3.4 微結構與成分分析 33 3.4.1 掃描式電子顯微鏡 (Scanning Electron Microscopy, SEM) 33 3.4.2 X光繞射分析 (X-ray Diffraction, XRD) 33 3.4.3 電子探針顯微分析 (Electron Probe Microanalyzer, EPMA) 34 3.4.4 原子力顯微鏡 (Atomic Force Microscopy, AFM) 35 3.5 磨耗試驗 36 第四章 實驗結果與討論 38 4.1 CoCrNiSi0.15材料特性 38 4.1.1 微結構分析 38 4.1.2 磨耗試驗 40 4.2 改變氣體比例對CrN薄膜的影響 42 4.2.1 微結構分析 42 4.2.2 磨耗性能分析 47 4.2.3 磨耗軌跡分析 49 4.3 改變濺鍍功率對CrN薄膜的影響 53 4.3.1 微結構分析 53 4.3.2 磨耗性能分析 56 4.3.3 磨耗軌跡分析 57 第五章 結論 60 第六章 參考文獻 62 | - |
dc.language.iso | zh_TW | - |
dc.title | 磁控濺鍍CrN薄膜提升CoCrNiSi₀.₁₅中熵合金抗磨耗性能之研究 | zh_TW |
dc.title | Study on the Improvement of Wear Resistance Performance of CoCrNiSi₀.₁₅ MEA by Magnetron Sputtered CrN Thin Film | en |
dc.type | Thesis | - |
dc.date.schoolyear | 112-1 | - |
dc.description.degree | 碩士 | - |
dc.contributor.oralexamcommittee | 薛人愷;林昆明 | zh_TW |
dc.contributor.oralexamcommittee | Ren-Kae Shiue;Kun-Ming Lin | en |
dc.subject.keyword | 中熵合金,磁控濺鍍,耐磨耗,氮化鉻鍍層,物理氣相沉積, | zh_TW |
dc.subject.keyword | medium-entropy alloy,magnetron sputtering,wear resistance,chromium nitride coating,PVD, | en |
dc.relation.page | 66 | - |
dc.identifier.doi | 10.6342/NTU202400353 | - |
dc.rights.note | 未授權 | - |
dc.date.accepted | 2024-02-02 | - |
dc.contributor.author-college | 工學院 | - |
dc.contributor.author-dept | 材料科學與工程學系 | - |
顯示於系所單位: | 材料科學與工程學系 |
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