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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 鄭修偉 | zh_TW |
| dc.contributor.advisor | Hsiu-Wei Cheng | en |
| dc.contributor.author | 張語晏 | zh_TW |
| dc.contributor.author | Yu-Yen Chang | en |
| dc.date.accessioned | 2024-02-22T16:40:55Z | - |
| dc.date.available | 2024-02-23 | - |
| dc.date.copyright | 2024-02-22 | - |
| dc.date.issued | 2024 | - |
| dc.date.submitted | 2024-02-06 | - |
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/91777 | - |
| dc.description.abstract | 近年來，多主元素合金薄膜的概念在合金設計領域中引起廣泛的興趣。特別是鉻成分在提升合金在電化學穩定性方面的作用，已在腐蝕科學研究中受到重視。然而，單純調整多主元素合金中鉻的比例，對於增強其抗腐蝕的效果有限。因此，深入理解鉻與其他合金元素的交互作用，對於進一步提升合金性能至關重要。本研究著重於以鎳鉻為基底的多主元素合金薄膜，探究其中功能元素的電化學相關性。研究涵蓋採用電漿濺鍍法製備的鎳鉻、鎳鈷鉻、鎳鉻鐵以及鎳鉻鈷鐵合金系統。我們在中性氯化鈉溶液中進行電化學實驗，並結合時間解析光學顯微鏡及感應耦合電漿質譜，來分析合金的電化學性能。此外，透過兩種 X 射線光電子能譜和 X 射線吸收光譜技術，研究表面殘留物和鈍化膜結構的變化。根據 X 射線光電子能譜和 X 射線吸收光譜的結果，我們發現在鎳鈷鉻和鎳鉻系統中，氫氧化鉻的生成會降低其抗腐蝕能力，可能導致鉻氧化態的提升，以及推測在較高氧化電位下的鉻離子溶解。通過感應耦合電漿質譜和 X 射線光電子能譜評估，我們進一步發現鐵似乎在增強三氧化二鉻鈍化膜穩定性方面起著關鍵作用。本研究通過各種分析方法揭示了腐蝕機制中元素間的交互作用，這不僅能深入理解對多主元素合金腐蝕中基本電化學過程，而且對開發新型提升抗腐蝕性的材料具有重要意義。 | zh_TW |
| dc.description.abstract | The concept of multi-principal element alloy (MPEA) thin films has gained interest in alloy design in recent years. Particularly the role of Cr composition for improving electrochemical passivity has garnered attention in corrosion science. However, tuning Cr composition alone in MPEAs can only push corrosion passivity to a certain extent. This makes understanding the cross-elemental interaction of Cr with other alloy compounds vital in order to further improve alloy performance. Therefore, this research mainly focuses on electrochemical correlation across functional elements in plasma sputtered NiCr-based MPEA thin films within NiCr, NiCoCr, NiCrFe, and NiCrCoFe systems. We employed in-situ electrochemical optical microscopy combined with ICPMS in neutral sodium chloride solution as well as ex-situ XPS, HAXPES and XAS to investigate the electrochemical performance of alloys as well as the remain products and passive film structure changes.
Based on XPS and XAS results, we find that the formation of Cr(OH)3 on Cr2O3 passive films weakens corrosion resistance in the NiCoCr and NiCr systems, potentially leading to increased oxidation states of Cr and ion dissolution at higher oxidation potentials. Using a multidisciplinary analytical approach to gauge into Fe dissolution, we further discover that the particular role Fe plays in supporting the stability of Cr2O3 in passive films. The comprehensive analysis methods outlined in this work sheds a light on elemental interactions involved in corrosion mechanisms, which allows not only in depth understanding of fundamental electrochemical processes involved in corrosion of MPEAs but will have implications in developing new and improved materials for corrosion resistance. | en |
| dc.description.provenance | Submitted by admin ntu (admin@lib.ntu.edu.tw) on 2024-02-22T16:40:55Z No. of bitstreams: 0 | en |
| dc.description.provenance | Made available in DSpace on 2024-02-22T16:40:55Z (GMT). No. of bitstreams: 0 | en |
| dc.description.tableofcontents | Acknowledgements i
摘要 iii Abstract v Contents vii List of Figures xi Denotation xv Chapter 1 Introduction 1 1.1 Passive Films in Corrosion Protection 1 1.1.1 The theory of passive films 1 1.1.2 The mechanism of passive film breakdown 3 1.1.3 The crucial role of Cr in passive films 5 1.2 Corrosion Resistance Study of MPEA Coatings 6 1.2.1 The concept of MPEAs 6 1.2.2 The impact of the addition element on corrosion behaviors 9 1.3 In-situ and Ex-situ Advanced Techniques in Corrosion Research 11 1.4 Highlights of This Work 13 Chapter 2 Experimental Section 15 2.1 Materials and Chemicals . . . . . . . . . . . . . . . . . . . . . . . .15 2.2 Substrate Preparation . . . . . . . . . . . . . . . . . . . . . . . . . .16 2.3 Thin Film Deposition . . . . . . . . . . . . . . . . . . . . . . . . . .17 2.3.1 Magnetron sputtering deposition . . . . . . . . . . . . . . . . . . .17 2.3.2 Thin film deposition . . . . . . . . . . . . . . . . . . . . . . . . . .18 2.4 In-situ Electrochemical Measurement of Corrosion . . . . . . . . . .19 2.4.1 Experimental setup . . . . . . . . . . . . . . . . . . . . . . . . . .20 2.4.2 Measurements of electrochemical experiments . . . . . . . . . . . .20 2.4.3 Measurement of ICPMS . . . . . . . . . . . . . . . . . . . . . . .22 2.5 Ex-situ Characterization of Thin Films . . . . . . . . . . . . . . . . .24 2.5.1 Measurement of dual XPS . . . . . . . . . . . . . . . . . . . . . .24 2.5.2 Measurement of synchrotron X-ray absorption spectroscopy . . . .26 2.6 Data Analysis . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .29 2.6.1 Transmittance analysis . . . . . . . . . . . . . . . . . . . . . . . .29 2.6.2 Data analysis of ICPMS . . . . . . . . . . . . . . . . . . . . . . . .29 2.6.3 Data analysis of XPS . . . . . . . . . . . . . . . . . . . . . . . . .29 Chapter 3 Results and Discussion33 3.1 Transmittance Analysis for NiCr-Based MPEAs . . . . . . . . . . .33 3.2 Elemental Analysis for NiCr-Based MPEA Thin Films . . . . . . . .35 3.2.1 Time-resolved elemental analysis by ICPMS . . . . . . . . . . . . .35 3.2.2 Ex-situ XPS quantitative analysis . . . . . . . . . . . . . . . . . . .37 3.3 Investigation of Chemical States in Cr . . . . . . . . . . . . . . . .39 3.3.1 XPS analysis of chemical states changes in Cr after corrosion . . . .39 3.3.2 XANES insight in post-corrosion chemical states in Cr . . . . . . .42 3.3.3 Short summary of XPS study in Cr . . . . . . . . . . . . . . . . . .43 3.4 Understanding the Dissolution Mechanism of Cr . . . . . . . . . . .45 3.5 Interface Characterization in NiCoCr Thin Films via HAXPES . . . .46 3.6 The Role of Fe in Corrosion Resistance of MPEA Thin Films . . . .49 3.7 Four Hypothesized MPEA Systems in This Study . . . . . . . . . . .52 Chapter 4 Conclusions 55 References 57 Appendix A— Published Paper 65 | - |
| dc.language.iso | en | - |
| dc.subject | 多主元素合金 | zh_TW |
| dc.subject | 腐蝕 | zh_TW |
| dc.subject | X射線吸收光譜 | zh_TW |
| dc.subject | 時間解析電感耦合電漿體質譜法 | zh_TW |
| dc.subject | 硬X射線光電子能譜 | zh_TW |
| dc.subject | Hard X-ray photoelectron spectroscopy | en |
| dc.subject | Time-resolved inductively coupled plasma mass spectrometry | en |
| dc.subject | X-ray absorption spectroscopy | en |
| dc.subject | Multi-principal element alloys | en |
| dc.subject | Corrosion | en |
| dc.title | 多主元素合金薄膜之組成對其電化學穩定性之影響 | zh_TW |
| dc.title | Influence of Composition on Electrochemical Stability of Multi-Principal Element Alloy Thin Films | en |
| dc.type | Thesis | - |
| dc.date.schoolyear | 112-1 | - |
| dc.description.degree | 碩士 | - |
| dc.contributor.oralexamcommittee | 姜昌明;簡儀欣;陳重佑 | zh_TW |
| dc.contributor.oralexamcommittee | Chang-Ming Jiang;Yi-Hsin Chien;Chong-You Chen | en |
| dc.subject.keyword | 腐蝕,多主元素合金,硬X射線光電子能譜,時間解析電感耦合電漿體質譜法,X射線吸收光譜, | zh_TW |
| dc.subject.keyword | Corrosion,Multi-principal element alloys,Hard X-ray photoelectron spectroscopy,Time-resolved inductively coupled plasma mass spectrometry,X-ray absorption spectroscopy, | en |
| dc.relation.page | 73 | - |
| dc.identifier.doi | 10.6342/NTU202400530 | - |
| dc.rights.note | 未授權 | - |
| dc.date.accepted | 2024-02-11 | - |
| dc.contributor.author-college | 理學院 | - |
| dc.contributor.author-dept | 化學系 | - |
| 顯示於系所單位： | 化學系 | |
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