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| ???org.dspace.app.webui.jsptag.ItemTag.dcfield??? | Value | Language |
|---|---|---|
| dc.contributor.advisor | 彭隆瀚 | zh_TW |
| dc.contributor.advisor | Lung-Han Peng | en |
| dc.contributor.author | 馮晨維 | zh_TW |
| dc.contributor.author | Chen-Wei Feng | en |
| dc.date.accessioned | 2023-06-20T16:11:26Z | - |
| dc.date.available | 2023-11-10 | - |
| dc.date.copyright | 2023-06-20 | - |
| dc.date.issued | 2023 | - |
| dc.date.submitted | 2023-01-13 | - |
| dc.identifier.citation | 1. http://www.dcbo.com.tw/pro05.html
2. Wang et al., Bias tuning charge-releasing leading to negative differential resistance in amorphous gallium oxide/Nb:SrTiO3 heterostructure, Appl. Phys. Lett. 107, 262110 (2015) 3. Riikka L. Puurunen, Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process, Journal of Applied Physics 97, 121301 (2005) 4. P. C. Wang et al., Bias tuning charge-releasing leading to negative differential resistance in amorphous gallium oxide/Nb:SrTiO3 heterostructure, Appl. Phys. Lett. 107, 262110 (2015). 5. B.E. Kananen, N.C. Giles, L.E. Halliburton, G.K. Foundos, K.B. Chang, and K.T. Stevens, J. Appl. Phys.122, 215703 (2017). 6. Takahiro Shiga, Hisayoshi Fujikawa, and Yasunori Taga , "Design of multiwavelength resonant cavities for white organic light-emitting diodes", Journal of Applied Physics 93, 19-22 (2003) https://doi.org/10.1063/1.1527708. 7. B.W Lee et al., Journal of the SID 17/2, 151 (2009). 8. 侯秉宏,“於多晶矽基板上生長GaOx之發光二極體特性研究”, 國立台灣大學光電工程學研究所碩士論文(2021). 9. 李柏廷,“電漿輔助型原子層沉積之發光二極體特性研究”, 國立台灣大學光電工程學研究所碩士論文(2014). 10. 謝提如,“在多晶矽基板上以剝離成形法製成具分佈式布拉格反射鏡之矽基氧化鎵發光元件”, 國立台灣大學光電工程學研究所碩士論文(2021). 11. F. Gou et al., Opt. Exp. 27, A 746 (2019). 12. Ahvaz. Kosarian et al., Role of sputtering power on the microstructural and electro-optical properties of ITO thin films deposited using DC sputtering technique, 12 September 2017 13. Matthew S. Wong et al, High efficiency of III-nitride micro-light-emitting diodes by sidewall passivation using atomic layer deposition, Vol. 26, Issue 16, pp. 21324-21331 (2018) 14. Lawrence N. Dworsky, Introduction to Numerical Electrostatics Using MATLAB,2014. Online ISBN:9781118758571 DOI:10.1002/9781118758571 15. 楊明輝,“透明導電膜材料與成膜技術的新發展”,工業材料,第189期,2000,pp.161~174 16. 黃柏詠,“射頻濺鍍氧化鎵在多晶矽基板上之發光二極體特性研究”, 國立台灣大學光電工程學研究所碩士論文(2021). | - |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/87582 | - |
| dc.description.abstract | 此論文主要探討利用射頻濺鍍系統及原子層沉積系統,透過量測系統討論發光二極體特性,製程上透過加熱基板溫度生長氮氧化鎵於多晶矽基板上,並利用光罩的圖形設計、改變濺鍍生長溫度及厚度、快速熱退火(Rapid thermal anneal,RTA)、氧化銦錫(ITO)共振特性探討及側壁保護改善電流等實驗,經過電性量測、光譜量測及ITO電阻率、穿透率比較後,製作出發光效率高的色心自發光二極體。
內容分為四部分,第一部分為介紹色心自發光二極體及Fabry-Perot共振腔原理;第二部分為製程機台介紹,包含濺鍍機、原子層沉積系統、量測系統及研磨機;第三部分為製程設計及完整製程步驟;第四部分為有助於特性優化的製程討論及電性與發光光譜分析,印證實驗結果。 有別於傳統GaN LED用藍光激發螢光粉或量子點材料產生指定波長的光譜,吾人以自身設計的製程方式與步驟製作色心自發光二極體產生特定波長於黃綠光波段(550nm),首先先將元件生長於特殊磊晶之p-poly Si基板上,然後透過許多變因改進製程與元件設計,包含溫度、厚度及側壁保護等,已明顯有發光效率提升,注入電流也更加有效率的元件優化性能。元件發光經過基板共振腔後,發光光譜朝向多波段光譜、發光強度增強等效能提升邁進,使得色心自發光二極體未來發展更有前景。 | zh_TW |
| dc.description.abstract | This thesis discusses the use of material deposition methods composed of the radio frequency (RF) sputtering system and atomic layer deposition system (PE-ALD) with the measurement system to characterize the gallium oxynitride of color-center light-emitting diodes. The device processes contain the following steps: substrate heating at Tg= 500℃ for sputtering the gallium oxynitride on the polysilicon substrate, the indium tin oxide (ITO) current spreading layer, the use of rapid thermal annealing (RTA), and passivation to reduce side wall leakage was fabricated.
The contents of this thesis are divided into four parts. The first part introduces the principle of color center self-luminous diodes and Fabry-Perot resonant cavity. The second part introduces the process equipment, including RF sputter, atomic layer deposition system, measurement system and grinding machine. The third part is the process design and the complete fabrication steps. The fourth part is the electrical and spectrum analysis that help to optimize the device design. Different from GaN pumped phosphors or quantum dot LEDs, we fabricate gallium oxynitride color-center self-luminous diodes to generate broad yellow-orange light band (550~700nm). The device is grown on a p-poly Si substrate, and the device performance can be improved through many factors, including temperature, thickness and passivation etc. The device electro-spectrum exhibit single or multi-band spectrum, reflecting the optical resonace effect with the cavity thickness in the vertical direction, which The latter makes the future development of color center self-luminous diodes more promising. | en |
| dc.description.provenance | Submitted by admin ntu (admin@lib.ntu.edu.tw) on 2023-06-20T16:11:26Z No. of bitstreams: 0 | en |
| dc.description.provenance | Made available in DSpace on 2023-06-20T16:11:26Z (GMT). No. of bitstreams: 0 | en |
| dc.description.tableofcontents | 目錄
口試委員會審定書 I 摘要 II Abstract IV Chapter 1 緒論 1 1.1 簡介 1 1.2 研究動機與目的 2 1.3 論文內容概述 5 Chapter 2 色心自發光二極體及多層膜共振之特性 7 2.1 Fabry-Perot共振原理 7 2.2 色心自發光二極體之發光原理 9 2.2 多層膜共振腔之特性 11 Chapter 3 實驗機台介紹及材料分析 15 3.1濺鍍技術及原理 .15 3.2 PE-ALD成長機制簡介及材料分析 18 3.2.1 ALD成長機制簡介 20 3.2.1 PEALD成長機制簡介及材料分析 20 3.3 研磨拋光機簡介 24 3.3.1 研磨拋光機原理簡介 24 Chapter 4 發光二極體研製及製程參數制定 26 4.1 發光二極體設計 26 4.2 發光二極體元件製作 28 4.3 量測系統 34 4.4 ITO穿透率、電阻率量測 42 4.5 研磨底部基板 45 Chapter 5 發光二極體之特性優化 46 5.1 濺鍍之基板溫度對共振波長效應 46 5.2 濺鍍之厚度調整與理論驗證 49 5.3 ITO厚度調整,對於共振出之波長影響 52 5.4 基板玻璃層減薄對於垂直共振光強度調整 55 5.5 側壁保護前後之電流比較 62 5.6 ITO基板溫度調整,對於電性之影響 65 Chapter 6 結論與未來展望 72 參考文獻 74 | - |
| dc.language.iso | zh_TW | - |
| dc.subject | 側壁鈍化 | zh_TW |
| dc.subject | 濺鍍 | zh_TW |
| dc.subject | 高溫 | zh_TW |
| dc.subject | 側壁鈍化 | zh_TW |
| dc.subject | 濺鍍 | zh_TW |
| dc.subject | 氮氧化鎵 | zh_TW |
| dc.subject | 發光二極體 | zh_TW |
| dc.subject | 氮氧化鎵 | zh_TW |
| dc.subject | 高溫 | zh_TW |
| dc.subject | 發光二極體 | zh_TW |
| dc.subject | high temperature | en |
| dc.subject | LED | en |
| dc.subject | GaON | en |
| dc.subject | sputter | en |
| dc.subject | passivation | en |
| dc.subject | high temperature | en |
| dc.subject | LED | en |
| dc.subject | GaON | en |
| dc.subject | sputter | en |
| dc.subject | passivation | en |
| dc.title | 高溫濺鍍生長氮氧化鎵於多晶矽基板上之發光二極體特性研究 | zh_TW |
| dc.title | Characterization of High Temperature Grown GaON Light Emitting Diodes on Poly-Si Substrates by the Sputtering Method | en |
| dc.type | Thesis | - |
| dc.date.schoolyear | 111-1 | - |
| dc.description.degree | 碩士 | - |
| dc.contributor.oralexamcommittee | 毛明華;賴聰賢 | zh_TW |
| dc.contributor.oralexamcommittee | Ming-Hua Mao;Tsong-Sheng Lay | en |
| dc.subject.keyword | 發光二極體,氮氧化鎵,濺鍍,側壁鈍化,高溫, | zh_TW |
| dc.subject.keyword | LED,GaON,sputter,passivation,high temperature, | en |
| dc.relation.page | 74 | - |
| dc.identifier.doi | 10.6342/NTU202300057 | - |
| dc.rights.note | 同意授權(限校園內公開) | - |
| dc.date.accepted | 2023-01-16 | - |
| dc.contributor.author-college | 電機資訊學院 | - |
| dc.contributor.author-dept | 光電工程學研究所 | - |
| dc.date.embargo-lift | 2025-01-04 | - |
| Appears in Collections: | 光電工程學研究所 | |
Files in This Item:
| File | Size | Format | |
|---|---|---|---|
| ntu-111-1.pdf Access limited in NTU ip range | 3.41 MB | Adobe PDF |
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