請用此 Handle URI 來引用此文件：
http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/82035完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 沈弘俊(Horn-Jiunn Sheen) | |
| dc.contributor.author | Yi-Hung Shen | en |
| dc.contributor.author | 沈一泓 | zh_TW |
| dc.date.accessioned | 2022-11-25T05:34:29Z | - |
| dc.date.available | 2024-10-16 | |
| dc.date.copyright | 2021-08-20 | |
| dc.date.issued | 2020 | |
| dc.date.submitted | 2021-07-22 | |
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/82035 | - |
| dc.description.abstract | "本研究的目標在於開發將表面電漿共振晶片與預濃縮器結合之新型免標定免疫分析生醫晶片，藉由熱轉印技術製作奈米狹縫(Nanoslit)表面電漿共振晶片(Surface Plasmon Resonance,SPR)，再利用聚二甲基矽氧烷(PDSM)製作預濃縮微米流道，配合Nafion奈米孔隙流道做為離子選擇性通道，結合成一個新型的生醫檢測平台。將活性較高的分子修飾在共振檢測金屬薄膜上，藉由電壓調整控制濃縮區塊於檢測共振金屬上方，結由活性分子與待測生物檢體結合，產生光譜訊號紅移進行免疫分析。 本實驗利用射出成型技術製作表面電漿共振晶片，取代熱壓印技術，提升鏡片製作的效率並降低製作成本，再利用矽晶圓塗佈SU-8光阻，將流道藉由微影技術(Lithography)成型矽晶圓上製作出可重複利用之母模，再利用熱蒸鍍機將鋁金屬薄膜鍍上共振奈米狹縫，接著使其金屬表面氧化，並利用3-氨基丙基三乙氧基矽烷(3-Aminopropyltriethoxysilane, APTES)，使檢測區表面官能化，以利與待測樣本結合。流道設計上配合施加電壓，設定出最佳的空乏區長度(Ion Depletion Zone)與濃縮倍率，將低於檢測極限之樣本透過預濃縮技術聚集於檢測區域中，提升檢測最低極限。 本實驗使用之樣本為人類免疫球蛋白G之抗原 (Immunoglobulin G)、抗體(Anti-Human IgG)，將表面修飾帶有胺基之共振晶片通入高濃度100 ug/mL人類免疫球蛋白G(IgG)，光譜儀檢測極限為1ug/mL Anti-IgG，依序通入低於極限之樣本最後成功將量測極限提高至1 ng/mL Anti-IgG，並且濃縮倍率介於1000~10000倍之間。 " | zh_TW |
| dc.description.provenance | Made available in DSpace on 2022-11-25T05:34:29Z (GMT). No. of bitstreams: 1 U0001-1407202117124800.pdf: 3989613 bytes, checksum: 7c8fb8dcef7fe313ab88adbadab29916 (MD5) Previous issue date: 2020 | en |
| dc.description.tableofcontents | 致謝 1 摘要 2 ABSTRACT 3 第一章 導論 10 1.1 前言 10 1.2 研究動機 10 1.3 研究方法 11 1.4 論文架構 11 第二章 文獻回顧 12 2.1 生物晶片檢測技術 12 2.1.1 免疫分析法(Immunoassay) 12 2.1.2 免疫分析法之比較 12 2.2 預濃縮技術發展背景 13 2.2.1 電驅動微奈米流體預濃縮晶片之發展 14 2.3 表面電漿共振之發展背景 17 2.3.1 表面電漿共振用於免疫分析 18 第三章 實驗原理 21 3.1 電驅動微奈米預濃縮機制之原理 21 3.1.1 電驅動微奈米流體預濃縮法 21 3.1.2 電雙層效應 21 3.1.3 離子區域性空乏與濃縮現象 24 3.2 表面電漿共振應用原理 27 3.2.1 表面電漿共振簡介 27 3.2.2 金屬表面電漿共振 27 3.2.3 表面電漿共振激發 31 奈米金屬狹縫表面電漿耦合共振模態 32 3.3 週期性奈米狹縫結構表面電漿共振用於免疫分析 34 3.3.1 週期性奈米金屬表面折射率與蛋白質之關係 34 第四章 實驗架設與裝置製程 37 4.1 預濃縮流道設計 37 4.2 奈米流道製程及塗佈奈米選擇性薄模 40 4.3 射出成形晶片對位及鍍膜 40 4.4 流道與檢測基板封裝 46 4.5 實驗光路架設 48 4.6 預濃縮迴路架設及其他 50 第五章 實驗結果 51 5.1 預濃縮螢光實驗驗證 51 5.2 表面電漿共振晶片檢測極限及檢量線 53 5.2.1 表面電漿共振晶片之靈敏度測試 54 5.2.2 免疫分析之檢量結果 54 5.3 預濃縮機制用於表面電漿共振檢測之實驗結果 60 5.3.1 預濃縮應用之實驗結果 61 第六章 結論與未來展望 77 6.1 結論 77 References 78 | |
| dc.language.iso | zh-TW | |
| dc.subject | 射出成型晶片 | zh_TW |
| dc.subject | 生物感測器 | zh_TW |
| dc.subject | 週期性奈米狹縫金屬表面電漿共振 | zh_TW |
| dc.subject | 電驅動奈米流體預濃縮 | zh_TW |
| dc.subject | 奈米壓印技術 | zh_TW |
| dc.subject | 實驗室晶片 | zh_TW |
| dc.subject | 免標定免疫分析 | zh_TW |
| dc.subject | Lab On Chip | en |
| dc.subject | Injection Molding Chip | en |
| dc.subject | Microfluidic Preconcentration | en |
| dc.subject | Immunoassay | en |
| dc.subject | Biosensor | en |
| dc.subject | Nanoslit Surface Plasmon Resonance | en |
| dc.subject | Ion Concentration Polarization | en |
| dc.title | 整合預濃縮微米流道與表面電漿共振之奈米狹縫生物晶片用於高靈敏度免標定免疫分析檢測 | zh_TW |
| dc.title | Integration of Preconcentration micro-channel with Nanoslit Surface Plasmon Resonance Chip for high sensitivity Immunoassay detection | en |
| dc.date.schoolyear | 109-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.coadvisor | 魏培坤(Pei-Kuen Wei) | |
| dc.contributor.oralexamcommittee | 范育睿(Hsin-Tsai Liu),(Chih-Yang Tseng) | |
| dc.subject.keyword | 奈米壓印技術,電驅動奈米流體預濃縮,週期性奈米狹縫金屬表面電漿共振,生物感測器,免標定免疫分析,實驗室晶片,射出成型晶片, | zh_TW |
| dc.subject.keyword | Injection Molding Chip,Ion Concentration Polarization,Nanoslit Surface Plasmon Resonance,Biosensor,Immunoassay,Microfluidic Preconcentration,Lab On Chip, | en |
| dc.relation.page | 83 | |
| dc.identifier.doi | 10.6342/NTU202101468 | |
| dc.rights.note | 同意授權(限校園內公開) | |
| dc.date.accepted | 2021-07-22 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 應用力學研究所 | zh_TW |
| dc.date.embargo-lift | 2024-10-16 | - |
| 顯示於系所單位： | 應用力學研究所 | |
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