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請用此 Handle URI 來引用此文件: http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/73007
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dc.contributor.advisor廖先順
dc.contributor.authorCheng-Wei Chenen
dc.contributor.author陳正偉zh_TW
dc.date.accessioned2021-06-17T07:13:39Z-
dc.date.available2021-07-19
dc.date.copyright2019-07-19
dc.date.issued2019
dc.date.submitted2019-07-17
dc.identifier.citation[1] D. Rugar and P. Hansma, 'Atomic force microscopy,' Physics today, vol. 43, no. 10, pp. 23-30, 1990.
[2] G. Binnig and H. Rohrer, 'Scanning tunneling microscopy,' Surface science, vol. 126, no. 1-3, pp. 236-244, 1983.
[3] S. M. Salapaka and M. V. Salapaka, 'Scanning probe microscopy,' IEEE Control Systems Magazine, vol. 28, no. 2, pp. 65-83, 2008.
[4] P. Hansma, V. Elings, O. Marti, and C. Bracker, 'Scanning tunneling microscopy and atomic force microscopy: application to biology and technology,' Science, vol. 242, no. 4876, pp. 209-216, 1988.
[5] 吳耀庭,黃曉鳳,溫俊祥, '電漿表面處理在生醫材料上之應用'工業材料雜誌,212期(2004)
[6] J. R. Vig, 'UV/ozone cleaning of surfaces,' Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol. 3, no. 3, pp. 1027-1034, 1985.
[7] T. Takamatsu and S. Fujimura, 'Plasma surface treatment method and resulting device,' ed: Google Patents, 2003.
[8] P. Lindner,F.Shari, and V. Dragoi. 'Plasma activated wafer bonding for thin silicon-on-insulator substrate fabrication.' The Electrochemical Society,vol. 2004. no. 4, p. 97, 2004.
[9] G. Binnig, H. Rohrer, C.Gerber, and E. Weibel 'Surface studies by scanning tunneling microscopy'Physical Review Letters, vol. 49, no.1, pp. 57-61, 1982
[10] G. Binnig, C. F. Quate, and C. Gerber, 'Atomic force microscope,' Physical review letters, vol. 56, no. 9, p. 930, 1986.
[11] M. Tortonese, R. Barrett, and C. Quate, 'Atomic resolution with an atomic force microscope using piezoresistive detection,' Applied physics letters, vol. 62, no. 8, pp. 834-836, 1993.
[12] N. Blanc, J. Brugger, N. De Rooij, and U. Dürig, 'Scanning force microscopy in the dynamic mode using microfabricated capacitive sensors,' Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, vol. 14, no. 2, pp. 901-905, 1996.
[13] D. Rugar, H. Mamin, and P. Guethner, 'Improved fiber‐optic interferometer for atomic force microscopy,' Applied Physics Letters, vol. 55, no. 25, pp. 2588-2590, 1989.
[14] E.-T. Hwu, K.-Y. Huang, S.-K. Hung, and S. Hwang, 'Measurement of cantilever displacement using a compact disk/digital versatile disk pickup head,' Japanese Journal of Applied Physics, vol. 45, no. 3S, p. 2368, 2006.
[15] G. Meyer and N. M. Amer, 'Novel optical approach to atomic force microscopy,' Applied physics letters, vol. 53, no. 12, pp. 1045-1047, 1988.
[16] G. Meyer and N. M. Amer, 'Optical‐beam‐deflection atomic force microscopy: The NaCl (001) surface,' Applied Physics Letters, vol. 56, no. 21, pp. 2100-2101, 1990.
[17] A. Weisenhorn, P. Hansma, T. Albrecht, and C. Quate, 'Forces in atomic force microscopy in air and water,' Applied Physics Letters, vol. 54, no. 26, pp. 2651-2653, 1989.
[18] H. Ueyama, Y. Sugawara, and S. Morita, 'Stable operation mode for dynamic noncontact atomic force microscopy,' Applied Physics A: Materials Science & Processing, vol. 66, pp. S295-S297, 1998.
[19] Q. Zhong, D. Inniss, K. Kjoller, and V. Elings, 'Fractured polymer/silica fiber surface studied by tapping mode atomic force microscopy,' Surface Science Letters, vol. 290, no. 1-2, pp. L688-L692, 1993.
[20] G. Matei, E. Thoreson, J. R. Pratt, D. B. Newell, and N. Burnham, 'Precision and accuracy of thermal calibration of atomic force microscopy cantilevers,' Review of Scientific Instruments, vol. 77, no. 8, p. 083703, 2006.
[21] F. Meli and R. Thalmann, 'Long-range AFM profiler used for accurate pitch measurements,' Measurement Science and Technology, vol. 9, no. 7, p. 1087, 1998.
[22] G. Meyer and N. M. Amer, 'Simultaneous measurement of lateral and normal forces with an optical‐beam‐deflection atomic force microscope,' Applied physics letters, vol. 57, no. 20, pp. 2089-2091, 1990.
[23] I. Y. Sokolov, G. S. Henderson, and F. J. Wicks, ' The contrast mechanism for true atomic resolution by AFM in non-contact mode: quasi-non-contact mode?' Surface science, 381(1), L558-L562, 1997.
dc.identifier.urihttp://tdr.lib.ntu.edu.tw/jspui/handle/123456789/73007-
dc.description.abstract原子力顯微鏡為一常用於檢測奈米尺度下之表面物理性質之儀器,其具備不須抽真空且對導體與絕緣體都能有奈米尺度成像之能力,已廣泛被運用於掃描奈米尺度之表面輪廓與機械性質量測。然而目前大多數之商用原子力顯微鏡之掃描範圍僅達數百微米,且可放置之樣品尺寸相當受限,不適合用於如晶圓、面板等具有較大尺寸之樣品。基於原子力顯微鏡之力量檢測原理,本論文開發出具備336 mm × 160 mm大量測範圍之力量量測系統,可用以量測奈米尺度下之樣品黏彈性。此外,所開發之人機介面具有操作簡易以及可彈性修改等優點。利用此自製系統對親水性玻片進行表面黏滯力量測實驗,結果顯示使用紫外光臭氧(Ultraviolet/Ozone, UV/O_3)表面處理過之一球型探針所測得之黏滯力較未經過表面處理之一球型探針大約五倍。此外,此球型探針在未經UV/O_3處理與處理十分鐘之玻片上所量測之黏滯力相差約兩倍,顯示玻片經過越長時間之UV/O_3表面處理會造成越大之黏滯力,此趨勢與商用原子力顯微鏡之測試結果符合。zh_TW
dc.description.abstractAtomic force microscope (AFM) is a precision instrument for measuring the surface physical properties at nanoscale. Because the ability to measure both conductive and nonconducting samples in non-vacuum environment, AFM has been widely used to measure surface morphology and mechanical properties at nanoscale. However, the scan range of common AFMs is usually less than several hundred micrometers, and the sample size is limited and not suitable for large samples such as silicon wafers and display panels. In this thesis, a force measurement system with a large measuring range of 400 mm × 240 mm was developed to measure the sample viscoelasticity by using the force detection method of AFM. Moreover, the homemade human-machine interface is user-friendly and flexible for modification. In the experiments, the adhesion force between the AFM tips and the hydrophilic glass slides was measured. The adhesion force measured by a UV/O_3 surface treated spherical tip was five times larger than that measured by an untreated tip. Besides, the adhesion force between the spherical tip and a glass slide after 10 minutes UV/O_3 treatment is five times larger than the result on an untreated glass slide. This result shows that the adhesion force is positively correlated to the treatment time of sample treatment. This trend is coincident with the results obtained by a commercial AFM.en
dc.description.provenanceMade available in DSpace on 2021-06-17T07:13:39Z (GMT). No. of bitstreams: 1
ntu-108-R06522634-1.pdf: 3422476 bytes, checksum: 6fde7b179b3aa1efe7c8655e0000e3cd (MD5)
Previous issue date: 2019
en
dc.description.tableofcontents致謝 i
摘要 ii
Abstract iii
目錄 iv
表目錄 vii
圖目錄 viii
符號表 xi
第一章 緒論 1
1.1研究背景 1
1.2 文獻回顧 3
1.2.1原子力顯微鏡之歷史 3
1.2.2原子力顯微鏡懸臂檢測方式 5
1.2.3原子力顯微鏡操作模式 7
1.3研究目的 10
1.4內容簡介 10
第二章 力量量測系統設計概念 11
2.1力量量測系統架構 11
2.2力量感測系統 12
2.2.1奈米探針 12
2.2.2光偏折訊號回饋系統 13
2.3致動器系統 15
2.3.1壓電掃描器 15
2.3.2 XYZ軸步進馬達定位系統 16
2.4控制系統 17
2.4.1力量量測控制 18
2.4.2多點力量量測之定位控制 18
第三章 力量量測系統 20
3.1力量量測系統實體設計 20
3.1.1 XYZ軸步進馬達定位系統 21
3.1.2壓電掃描器與控制器 23
3.1.3光偏折檢測法光路設計圖 24
3.1.4探針針座設計圖 27
3.1.5可編程嵌入式控制器 28
3.2 LabVIEW人機介面 29
3.3力量量測系統量測步驟 33
3.3.1自動進針 35
3.3.2靈敏度校正 36
3.3.3單點與多點力量量測 38
第四章 力量量測系統性能檢測 40
4.1探針適用性測試 40
4.1.1矩形懸臂探針適用性量測結果 40
4.1.2矩形懸臂球型探針適用性量測結果 44
4.1.3探針適用性量測結果比較 47
4.2不同量測速度之力量量測結果差異 47
4.3重複量測分析 50
第五章 紫外光臭氧表面處理之親水性玻片黏滯力量測 53
5.1矩形懸臂探針量測多點黏滯力之結果 53
5.2矩形懸臂球型探針量測黏滯力之結果 57
5.2.1未處理及經UV/O_3處理矩形懸臂球型探針力量量測結果比較 57
5.2.2 UV/O_3處理矩形懸臂探針量測多點黏滯力結果 59
5.2.3與商用原子力顯微鏡黏滯力量測結果比較 63
第六章 結論與未來展望 64
參考文獻 66
附錄A 矩形懸臂探針(Cont-GD, Budget Sensors) 68
附錄B 矩形懸臂球型探針(TL-NCH, Nanosensors) 69
dc.language.isozh-TW
dc.subject原子力顯微鏡zh_TW
dc.subject紫外光臭氧表面處理zh_TW
dc.subject黏滯力zh_TW
dc.subjectAFMen
dc.subjectAdhesion forceen
dc.subjectUV/O_3 Surface treatmenten
dc.title大量測範圍力量量測系統之設計與開發zh_TW
dc.titleDesign and Development of a Force Measurement System with a Large Measuring Rangeen
dc.typeThesis
dc.date.schoolyear107-2
dc.description.degree碩士
dc.contributor.oralexamcommittee高豐生,楊志文
dc.subject.keyword原子力顯微鏡,黏滯力,紫外光臭氧表面處理,zh_TW
dc.subject.keywordAFM,Adhesion force,UV/O_3 Surface treatment,en
dc.relation.page69
dc.identifier.doi10.6342/NTU201901549
dc.rights.note有償授權
dc.date.accepted2019-07-17
dc.contributor.author-college工學院zh_TW
dc.contributor.author-dept機械工程學研究所zh_TW
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