請用此 Handle URI 來引用此文件:
http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/63241
標題: | 利用原子力顯微鏡探討聚吡咯-陽極氧化鋁薄膜超電容之電容衰退特性 Study on degradation of pollypyrrole / anodic aluminum oxide supercapacitor utilizing atomic force microscopre |
作者: | Tsung-Hua Tsai 蔡宗樺 |
指導教授: | 施文彬 |
關鍵字: | 聚吡,咯,陽極氧化鋁薄膜,超電容,非接觸聚合,原子力顯微鏡,衰退, polypyrrole,anodic aluminum oxide,supercapacitor,indirect method,atomic force microscope,degradation, |
出版年 : | 2012 |
學位: | 碩士 |
摘要: | In the field of supercapacitors, the degradation of capacitance caused from the volume change during redox was being mentioned for a long time. But there were few people studied it.
In this thesis, we used anodic aluminum oxide (AAO) as the substrate, taking advantage of the high specific surface area and synthesized polypyrrole (PPy) on it to make a supercapacitor electrode. The method which used to synthesize PPy was called indirect method. Atomic force microscope (AFM) scanning and cyclic voltammetry (CV) test were operated simultaneously to analyze the porosity change of the PPy film. The porosity of the PPy film was determined by an imaging program. Due to the hole structure of the AAO, the stress occurred within redox did not cause obvious damage on the film so the electrodes showed very good cyclic stability. |
URI: | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/63241 |
全文授權: | 有償授權 |
顯示於系所單位: | 機械工程學系 |
文件中的檔案:
檔案 | 大小 | 格式 | |
---|---|---|---|
ntu-101-1.pdf 目前未授權公開取用 | 3.24 MB | Adobe PDF |
系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。