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http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/55192完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 林招松 | |
| dc.contributor.author | Mao-Feng Tseng | en |
| dc.contributor.author | 曾茂峰 | zh_TW |
| dc.date.accessioned | 2021-06-16T03:50:44Z | - |
| dc.date.available | 2016-03-13 | |
| dc.date.copyright | 2015-03-13 | |
| dc.date.issued | 2014 | |
| dc.date.submitted | 2015-01-21 | |
| dc.identifier.citation | Reference
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/55192 | - |
| dc.description.abstract | 本研究旨在甲酸銨與尿素雙錯合系統中，藉由高電流密度的施加與硫代水楊酸的添加，開發出鍍液穩定、沉積速率高、無裂紋的三價鉻電鍍製程。研究中藉由哈氏槽檢視鍍液的電流密度操作窗口，並利用掃描式電子顯微鏡觀察鍍層的表面形貌、橫截面，為了檢視鍍層的結晶性，利用X光繞射分析儀進行分析，並使用電子微探儀進行鍍層中碳、硫的定量，另外，透過硬度測試以探討鍍層性質與電鍍條件之間的影響。
研究結果顯示，尿素的添加可提升鍍液穩定性與使用週期，在3.72M甲酸銨與3.72M尿素的雙錯合系統中，鍍液穩定性佳且有較寬的電流密度操作範圍。利用此鍍液在高電流密度條件下仍能獲得光亮鍍層的特性，添加硫代水楊酸後，施加高電流密度(80ASD)可獲得沉積速率0.33μm/min、厚度20μm的無裂紋三價鉻鍍層 | zh_TW |
| dc.description.abstract | Trivalent chromium electrodeposition process has some problems such as instability of the electrolyte, difficulty to obtain thick coating and cracks penetrating through the deposition. In this study, a wide operating range in applicable current density had been obtained by adjusting concentration of the complexing agent in trivalent chromium bath. Hull-cell test had been operated in this study to examine the range in applicable current density. The surface morphology and cross-section of the deposited coatings were observed by SEM. The crystallinity of the deposition was examined by X-ray diffraction. In addition, hardness test had been operated to make more discussion about the relation between properties of the chromium coating and the parameters of electrodeposition process.
The study reveals that adding urea would solve the problems of current efficiency decades with deposition time during trivalent chromium electrodeposition process. It is shown that the widest range in applicable current density is obtained from the bath containing 3.72M ammonium formate and 3.72M urea. After adding the thiosalicylic acid to the trivalent chromium bath, a thickness of 20μm, bright and crack-free coating can be obtained at a deposition rate of 0.33μm/min by applying current density of 80ASD. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-16T03:50:44Z (GMT). No. of bitstreams: 1 ntu-103-R01527049-1.pdf: 3828186 bytes, checksum: 7198d73f4bdfc162a40ee3163f3d29b7 (MD5) Previous issue date: 2014 | en |
| dc.description.tableofcontents | Content
誌謝 i Abstract iii 摘要 v Figure Caption ix Table caption xii Chapter 1 Introduction 1 1.1 Chromium Electrodeposition 1 1.2 Research purpose 2 Chapter 2 Literature Review 4 2.1 Electrodeposition Theory 4 2.1.1 Fundamental of Electrodeposition4 2.1.2 Faraday’s Law. 5 2.1.3 Current Density and Current Efficiency 6 2.1.4 Electrode Potential 9 2.1.5 The Current Distribution During Electrodeposition 11 2.2 Trivalent Chromium Electrodeposition 12 2.2.1 Applications of Chromium Deposition 12 2.2.2 Theory and Limitations of Trivalent Chromium Electrodeposition 13 2.2.3 Trivalent Chromium Electrodeposition System 20 2.2.4 Crack-free Trivalent Chromium Deposition 25 Chapter 3 Experimental Methods 33 3.1 Experimental Design 33 3.2 Electrolyte Preparation 35 3.3 Electrodeposition System 36 3.4 Specimen Preparation 37 3.5 Electrodeposition Process 38 3.6 Specimen Analysis 38 3.6.1 Thickness and current efficiency calculation 38 3.6.2 Hull Cell Test 40 3.6.3 Scanning Electron Microscope Observation 41 3.6.4 X-ray Diffraction 41 3.6.5 Electron Probe Micro-Analysis quantifying 42 Chapter 4 Results and Discussion 43 4.1 Electrolyte Development 43 4.1.1 Precipitation observation 43 4.1.2 Stability examination in Hull cell test 45 4.1.3 Effect of concentration of complexing agents on Hull cell test 50 4.2 Effect of current density in thiosalicylic acid bath 52 4.2.1 Hull cell test 52 4.2.2 Composition of coatings 54 4.2.3 Current efficiency and deposition rate 57 4.2.4 SEM observation 59 4.2.5 XRD characterization 68 4.2.6 Hardness test 72 4.2.7 Thick crack-free chromium coating 74 Chapter 5 Conclusions 77 Chapter 6 Future Prospect 79 Reference 80 | |
| dc.language.iso | en | |
| dc.subject | 三價鉻電鍍 | zh_TW |
| dc.subject | 硫代水楊酸 | zh_TW |
| dc.subject | 電流密度 | zh_TW |
| dc.subject | 沉積速率 | zh_TW |
| dc.subject | 無裂紋 | zh_TW |
| dc.subject | trivalent chromium electrodeposition | en |
| dc.subject | thiosalicylic acid | en |
| dc.subject | current density | en |
| dc.subject | deposition rate | en |
| dc.subject | crack-free | en |
| dc.title | 無裂紋三價鉻電鍍製程開發及研究 | zh_TW |
| dc.title | Electrodeposition of crack-free Chromium coating from trivalent Chromium bath | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 103-1 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 林景崎,黃清安,楊聰仁,黃憲中 | |
| dc.subject.keyword | 三價鉻電鍍,硫代水楊酸,電流密度,沉積速率,無裂紋, | zh_TW |
| dc.subject.keyword | trivalent chromium electrodeposition,thiosalicylic acid,current density,deposition rate,crack-free, | en |
| dc.relation.page | 83 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2015-01-21 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 材料科學與工程學研究所 | zh_TW |
| 顯示於系所單位： | 材料科學與工程學系 | |
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