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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 陳中平(Chung-Ping Chen) | |
dc.contributor.author | Meng-chun Chiu | en |
dc.contributor.author | 邱盟竣 | zh_TW |
dc.date.accessioned | 2021-06-15T07:07:44Z | - |
dc.date.available | 2010-12-10 | |
dc.date.copyright | 2010-12-10 | |
dc.date.issued | 2010 | |
dc.date.submitted | 2010-11-12 | |
dc.identifier.citation | [1] R. Petit, “Electromagnetic Theory of Gratings,” in Springer-Verlag, Berlin, 1980.
[2] Mingming Jiang, Theodor Tamir, Shuzhang Zhang, “Modal theory of diffraction by multilayered gratings containing dielectric and metallic components,” in J. Opt. Soc. Am. A 18, 2001. [3] Chung-Hsiang Lin, K. Ming Leung, Theodor Tamir, “Modal transmission-line theory of three-dimensional periodic structures with arbitrary lattice configurations,” in J Opt. Soc. Am. A 19, 2002. [4] http://www.rsoftdesign.com/ [5] William H. Press, Brian P. Flannery, Saul A. Teukolsky, William T. Vetterling, Numerical Recipes in C: The Art of Scientific Computing, 2nd Edition, Published 1992. [6] KK Lai, L. Yu, and S. Wang, “Mean-variance-skewness-kurtosis-based portfolio optimization,”in Proceedings of the First Internation Multi-Symposiums on Computer and Computational Sciences, vol.2, pp.292-297, April 2006. [7] Mayur Datar, Nicole Immorlica, Piotr Indyk, Vahab S. Mirrokni, “Locality-Sensitive Hashing Scheme Based on p-Stable Distributions,” Proceedings of the Symposium on Computational Geometry, 2004. [8] Juan-Antonio Carballo and Sani R. Nassif, “Impact of Design-Manufacturing Interface on SoC Design Methodologies,” in Proc. J. IEEE Design and Test of Computers, p.183-191, June 2004. [9] Chris A. Mack, “Lithographic Simulation: A Review,” in Proc. SPIE, Vol. 4440 Lithographic and Micro-machining Techniques for Optical Component Fabrication, No. 59, p. 53-72, 2001. [10] Tomoyuki Matsuyama, Yasuhiro Ohmura, and David M. Williamson, “The Lithographic Lens: Its History and Evolution,” in Proc. SPIE, Vol. 6154 Optical Microlithography XIX, p. 615403, 2006. [11] Szu-Kai Lin, An Efficient Contour Generation Algorithm for Micro-lithography Aerial Image. Master Thesis, National Taiwan University, 2009. [12] Louis Scheffer, Luciano Lavagno, Grant Martin, and Franklin M. Schellenberg, “Resolution Enhancement Techniques and Mask Data Preparation,” in EDA for IC Im- plementation, Circuit Design, and Process Technology, Chapter 18, CRC Press, 2006. [13] Ming-Fong Tsai, Abbe-PCA: Compact Abbe’s Kernel Generation for Micro-lithography Aerial Image Simulation using Principal Components Analysis. Master Thesis, National Taiwan University, 2009. [14] L. F. Thompson, C. G.Willson, and M. J. Bowden, Introduction to Micro-lithography. American Chemical Society, 1994. [15] P. Rai Choudhury, Handbook of Micro-lithography, Micro-machining, and Micro-fabrication. SPIE Press, 1997. [16] Burn J. Lin, Micro-lithography Theory and Practice. Lectures in National Taiwan University, 2006. [17] Nicolas B. Cobb and Y. Granik, “New Concepts in OPC,” in Proc. SPIE, vol. 5377, 2004. [18] P. Yu, D. Z. Pan, “A Novel Intensity-based Optical Proximity Correction Algorithm with Speed-up in Lithography Simulation,” in Proc. International Conference on Computer Aided Design, 2007. [19] Peng Yu, Sean X. Shi, and David Z. Pan, “Process Variation Aware OPC with Variational Lithography Modelling,“ in Proc. Design Automation Conference, p. 785-790, 2006. [20] A. K.Wong, Resolution Enhancement Techniques in Optical Lithography. SPIE Press, 2001. [21] Nicolas B. Cobb, Fast Optical and Process Proximity Correction Algorithms for Integrated Circuit Manufacturing, the University of Berkeley, 1998. [22] NVIDIA, CUDA Programming Guide v3.1.1, 2009 [23] NVIDIA, CUDA CUFFT Library, Feb 2010. [24] J. Breitbart CuPP – A framework for easy CUDA integration, HiPS 2009 workshop with IPDPS 2009, Rome, Italy, May 2009. [25] James W. Cooley, John W. Tukey, “An algorithm for the machine calculation of complex fourier series”, Math. Comput., vol. 19, pp. 297-313, 1965. [26] P. Duhamel, H. Hollman, “Split-radix FFT algorithms,” Electronics Letters, vol. 20, pp. 14-16, 1984 [27] http://www.fftw.org/ [28] M. Frigo, S.G. Johnson, “FFTW: an adaptive software architecture for the FFT,” in Proc. ICASSP, vol. 3, pp. 1381-1384, 1998 [29] Heinrich Kirchauer, Photo-lithography Simulation. PhD thesis, TU Vienna, 1998. [30] http://www.mathworks.com/help/techdoc/ref/fftshift.html | |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/48673 | - |
dc.description.abstract | 為了保證奈米壓印製造光柵的品質,光散射(optical scatterometry) 是一個有效率和有效的方法來診斷實際光柵的幾何形狀。為了方便診斷的過程,一個有效率針對大型資料庫的匹配演算法是非常重要的。在本篇論文中,我們提出一個有效的演算法利用最小誤差(MSE)的方式用來比對大型的頻譜資料庫,藉此反推始的幾何組態。我們利用奇異值分解(Singular Value Decomposition)對大型的資料庫作壓縮並使用分層的動差(Moment)匹配方式來執行匹配演算法。我們的搜尋和診斷演算法是非常快速且精確的。跟傳統的最小誤差比起來,快上了3000 倍以上且精確度在0.1\%以內。
光學微顯影成像技術(Optical micro-lithography image technology)是目前半導體製造中關鍵的一步。隨著著超大型積體電路(VLSI, very-large-scale integrated-circuit)製程的演進,元件的特徵尺寸(feature size)正挑戰曝光光源波長的解析極限。因此,各種製程中的非理想效應在設計以及驗證的階段都必須精確地納入考慮以及模擬,以確保製程的良率(good yield)以及功能正確性。然而在最先進的製程中,單一晶片上的元件數量動輒百萬,此一模擬與分析往往耗日廢時,因此如何快速得到成像結果的高速微顯影佔有相當重要的地位。在此論文中,我們提出以平行運算的方式來加速製程的模擬進而能提供更有效率最佳化以及驗證。 | zh_TW |
dc.description.abstract | To ensure the quality of the nano-imprint fabricated optical gratings, optical scatterometry (OS) is an efficient and effective mean to diagnose the actual fabricated geometry. To facilitate the diagnosis process,
efficient pattern matching algorithms over a huge database are of great importance. In my thesis, I will present an efficient algorithm to perform the least-square pattern matching in a huge simulated spectrum database. Equipped with singular value decomposition and hierarchical moment matching algorithm, the searching and diagnosis algorithm is extremely fast and accurate. It is over $3000 imes$ faster than a plain searching algorithm within 0.1\% accuracy. Optical micro-lithography image technology is a critical step in semiconductor manufacturing. As the VLSI manufacture technology develops, the feature size of micro-electronic devices shrinks smaller than the wavelength of exposure light source and challenges the limit of micro-lithography image system. Therefore, non-ideal effects in various processes of the stage of design and verification must be accurately taken into account and simulated to ensure a good yield of wafer and functional correctness. For this reason, high speed micro-lithography simulator is in strong demand for growing computational complexity to state-of-art resolution enhancement technology(RET) when handling modern industrial cases with millions of devices. In this work, we utilize parallel computing to speed up the image generation in micro-lithography simulation in order to provide more efficient optimization and verification. | en |
dc.description.provenance | Made available in DSpace on 2021-06-15T07:07:44Z (GMT). No. of bitstreams: 1 ntu-99-R96943019-1.pdf: 3510593 bytes, checksum: b47b305690e52876cf4dac489a946fd9 (MD5) Previous issue date: 2010 | en |
dc.description.tableofcontents | 1 Efficient and Accurate Scatterometry Diagnosis . . . . . . . . . . . 7
1.1 Introduction . . . . . . . . . . . . . . . . . . . . . . . . . . . 7 1.1.1 Background . . . . . . . . . . . . . . . . . . . . . . . . . . . 7 1.1.2 Motivation . . . . . . . . . . . . . . . . . . . . . . . . . . . 8 1.1.3 Process Flow . . . . . . . . . . . . . . . . . . . . . . . . . . 9 1.2 Methodology . . . . . . . . . . . . . . . . . . . . . . . . . . . 10 1.2.1 Database Construction . . . . . . . . . . . . . . . . . . . . . 10 1.2.2 Least Square Fitting . . . . . . . . . . . . . . . . . . . . . .11 1.2.3 Database Compaction using SVD method . . . . . . . . . . . . . .12 1.2.4 Moments of the Distribution: Mean, Variance, Skewness . . . . . 14 1.2.5 Segmented Moment Matching Method . . . . . . . . . . . . . . . .17 1.2.6 Grid-base Searching . . . . . . . . . . . . . . . . . . . . . . 20 1.3 Simulation Result . . . . . . . . . . . . . . . . . . . . . . . . 26 1.3.1 Database Parameter . . . . . . . . . . . . . . . . . . . . . . .26 1.3.2 Comparison . . . . . . . . . . . . . . . . . . . . . . . . . . .27 1.4 Conclusion . . . . . . . . . . . . . . . . . . . . . . . . . . . .30 2 Optical Lithography Simulation using GPU . . . . . . . . . . . . . .31 2.1 Introduction . . . . . . . . . . . . . . . . . . . . . . . . . . .31 2.1.1 Motivation . . . . . . . . . . . . . . . . . . . . . . . . . . .32 2.1.2 Semi-conductor Manufacture . . . . . . . . . . . . . . . . . . .32 2.1.3 Resolution Enhancement Technology . . . . . . . . . . . . . . . 39 2.2 Preliminary . . . . . . . . . . . . . . . . . . . . . . . . . . . 45 2.2.1 NVIDIA CUDA . . . . . . . . . . . . . . . . . . . . . . . . . . 45 2.2.2 Fourier Transform . . . . . . . . . . . . . . . . . . . . . . . 54 2.2.3 Partial Coherent Illumination . . . . . . . . . . . . . . . . . 57 2.3 Methodology . . . . . . . . . . . . . . . . . . . . . . . . . . . 61 2.3.1 Fourier-based Convolution . . . . . . . . . . . . . . . . . . . 62 2.3.2 Grid Organization . . . . . . . . . . . . . . . . . . . . . . . 65 2.4 Simulation Result . . . . . . . . . . . . . . . . . . . . . . . . 68 2.4.1 Specifications of CPU and GPU . . . . . . . . . . . . . . . . . 68 2.4.2 Comparison . . . . . . . . . . . . . . . . . . . . . . . . . . .69 2.5 Conclusion . . . . . . . . . . . . . . . . . . . . . . . . . . . .77 | |
dc.language.iso | en | |
dc.title | 衍射診斷的快速演算法和以GPU為基礎的光學微顯影模擬 | zh_TW |
dc.title | High-Speed Algorithms for Scatterometry Diagnosis and
GPU-based Optical Lithography Simulation | en |
dc.type | Thesis | |
dc.date.schoolyear | 99-1 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 王倫(Lon A. Wang),洪士灝(Shih-Hao Hung) | |
dc.subject.keyword | 光散射,頻譜診斷,奇異值分解,動差匹配,光學微顯影,繪圖處理器平行運算,計算統一設備架構, | zh_TW |
dc.subject.keyword | OS(optical scatterometry),spectrum diagnosis,SVD(singular value decomposition),moment matching,optical micro-lithography,GPU-based parallel computing,CUDA(compute unified device architecture), | en |
dc.relation.page | 81 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2010-11-16 | |
dc.contributor.author-college | 電機資訊學院 | zh_TW |
dc.contributor.author-dept | 電子工程學研究所 | zh_TW |
顯示於系所單位: | 電子工程學研究所 |
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