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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 李佳翰 | |
dc.contributor.author | Kuan-Yu Chu | en |
dc.contributor.author | 朱冠宇 | zh_TW |
dc.date.accessioned | 2021-06-15T05:44:12Z | - |
dc.date.available | 2016-08-20 | |
dc.date.copyright | 2011-08-20 | |
dc.date.issued | 2011 | |
dc.date.submitted | 2011-08-19 | |
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dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/46964 | - |
dc.description.abstract | 我們藉由二維時域有限差分法模擬倒Ω結構與閃電結構的表面電漿性質,並透過改變其共振腔體長度,尋找其局域電漿電場強度最強的參數後,經由微機電製程及電子束微影技術進行製造,將其應用至產生極紫外光光源系統之研究。此外,我們也針對極紫外光光源產生的高階諧波產生法進行討論,並且在超快光學與物理光學的基礎上建立規畫整個實驗架構,以及判斷整個實驗系統可能產生之結果,並預測極紫外光光源產生之強度。 | zh_TW |
dc.description.abstract | In this decade, extreme ultraviolet (EUV) light source is wildly discussed for the next generation lithographic light source. In order to develop the tabletop EUV light source system, we study the 2D surface plasmonic polaritons by applying the commercial software finite-difference time domain (FDTD). Though the process of varying the nanostructure cavity length, the best resonance parameter is found. So that the strongest localized surface plasmonic (LSP) field enhancement nanostructure will be applied to the extreme ultraviolet (EUV) experimental system. The plasmonic metallic nanostructure will be fabricated by nano-electro-mechanical system (NEMS) and E-beam lithography. We also discuss the high order harmonic generation (HHG) to radiate EUV light source, and build the experimental structure based on the physical optics. Therefore, we can estimate the results of EUV experimental setup and predict the EUV intensity in advance. | en |
dc.description.provenance | Made available in DSpace on 2021-06-15T05:44:12Z (GMT). No. of bitstreams: 1 ntu-100-R98525018-1.pdf: 7739302 bytes, checksum: bb0b60cf05c1c0dafe854db373eac072 (MD5) Previous issue date: 2011 | en |
dc.description.tableofcontents | 致謝 .....................................................................................................................i
中文摘要 ....................................................................................................................ii Abstract ...................................................................................................................iii Statement of Contribution iv Contents ....................................................................................................................v List of Figures vii Chapter 1 Introduction 1 1.1 Literature Review of Extreme Ultraviolet 1 1.2 Literature Review of Plasmonic Quality of Nanostructures 3 1.3 Objectives 4 1.4 Framework of the Thesis 4 Chapter 2 Research Method 6 2.1 High Harmonic Generation 6 2.1.1 Ponderomotive potential 6 2.1.2 Optical field ionization 8 2.1.3 Three step model 9 2.2 Plasmonics Application 10 2.2.1 Surface Plasmon Polaritons at Single Interface 10 2.2.2 Localized Surface Plasmons 12 Chapter 3 Surface Plasmonic Polaritons Simulation Results 17 3.1 Nanobottle Nanostructure of Different Gaps, Cavity Width and Length 18 3.3 Lightening Shape Different Gaps and Line width 20 Chapter 4 Experimental Setup 59 4.1 Clean Room 59 4.2 Femtolaser 60 4.3 Vacuum Chamber 60 4.4 Optical Path Design 61 4.4.1 Gaussian Laser Beam 61 4.4.2 Dispersion Compensation 62 4.4.3 Focusing Spot 63 4.4.4 Grating 63 4.4.5 Photon Multiplier Tube 64 4.4.6 Optical Path Design 65 4.4.7 Experiment 66 Chapter 5 Conclusion and Future Work 79 5.1 Conclusion 79 5.2 Future work 80 Reference: ..................................................................................................................84 VITA ..................................................................................................................88 | |
dc.language.iso | en | |
dc.title | 應用具有電漿子效應之金屬奈米結構於極紫外光光源系統開發 | zh_TW |
dc.title | Applying Metallic Nanostructures with Plasmonic Effects to Develop Extreme Ultraviolet Light Source System | en |
dc.type | Thesis | |
dc.date.schoolyear | 99-2 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 顏家鈺,鍾添東,蔡坤諭,李坤彥 | |
dc.subject.keyword | 時域有限差分法,局域電漿電場,極紫外光,高階諧波產生法, | zh_TW |
dc.subject.keyword | localized surface plasmons (LSP),extreme ultraviolet (EUV),high order harmonic generation (HHG), | en |
dc.relation.page | 88 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2011-08-19 | |
dc.contributor.author-college | 工學院 | zh_TW |
dc.contributor.author-dept | 工程科學及海洋工程學研究所 | zh_TW |
顯示於系所單位: | 工程科學及海洋工程學系 |
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