請用此 Handle URI 來引用此文件：
http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/46811完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 陳奕君(I-Chun Cheng),陳建彰(jchen@ntu.edu.tw) | |
| dc.contributor.author | Wen-Chen Guo | en |
| dc.contributor.author | 郭紋辰 | zh_TW |
| dc.date.accessioned | 2021-06-15T05:41:44Z | - |
| dc.date.available | 2013-08-31 | |
| dc.date.copyright | 2010-08-31 | |
| dc.date.issued | 2010 | |
| dc.date.submitted | 2010-08-25 | |
| dc.identifier.citation | 第一章
1-1 楊明輝，透明導電膜，藝軒圖書出版社 (2006) 1-4. 1-2 C. G. Granqvist, Solar Energy Materials & Solar Cells 91 (2007) 1533-1534. 1-3 H.Kim, J.S.Horwitz, S.B.Qadri, D.B.Chrisey Thin Solid Films 420 –421 (2002) 107–111. 1-4 C. G. Granqvist, Solar Energy Materials & Solar Cells 91 (2007) 1563-1564. 第二章 2-1 C. G. Granqvist, Solar Energy Materials & Solar Cells 91 (2007) 1529-1598. 2-2 吳坤陽，'溶凝膠法製備含銀之AZO 透明導電膜的研究'國立成功大學化學更 程學系碩士論文 (2005) 17. 2-3 J. C. Sun, J. Z. Zhao, H. W. Liang, J. M. Bian, L. Z. Hu, H. Q. Zhang, X. P. Liang, W. F. Liu, and G. T. Du. Appl. phys. 90 (2007) 121-128. 2-4 D. Gallagher,F. Scanlan, R. Houriet, H. J. Mathieu,and T. A. Ringc, J. Mater.Res. 8 (1993) 31-35. 2-5 Y. S. Park, H. K. Park, J. A. Jeong, H. K. Kim,K. H. Choi, S. In. Na, D. Y. Kimc, J. Electrochem. Soc. 156 (2009) 588-594. 2-6 Y.S. Kim, J.H. Park, D.H. Choi, H.S. Jang, J.H. Lee, H.J. Park, J.I. Choi, D.H. Ju, J.Y. Lee, Daeil Kim, Appl. Surf. Sci. 254 (2007) 1524–1527. 2-7 B. Houng, Appl. phys. 87 (2005) 251922. 2-8 吳坤陽，'溶凝膠法製備含銀之AZO 透明導電膜的研究'國立成功大學化學更 程學系碩士論文 (2005) 78-87. 2-9 吳定峰，'含奈米金屬微粒於ITO 膜的研究'，大同大學材料工程研究所碩士 論文 (2004) 20-33. 2-10 楊明輝，透明導電膜，藝軒圖書出版社 (2006) 53-55. 2-11 H. Odaka, Y. Shigesato, T. Murakami, S. Iwata, Jpn. J. Appl. Phys. 40 (2001) 3231–3235. 2-12 Y. Takahashi, S. Okada, R. B. H. Tahar, K. Nakano, T. Ban, Y. Ohya, J. Non-Cryst. Solids 218 (1997) 129–134. 2-13 J. C. C. Fan, J. B. Goodenough, J. Appl. Phys. 37 (1977) 299. 2-14 K. L.Chora, S. Major and D. K. Pandya, Thin Solid Films 102 (1983) 1-46. 2-15 楊明輝，透明導電膜，藝軒圖書出版社 (2006) 37-46. 2-16 蔡裕榮,周禮君，'以溶膠凝膠法製備透明導電氧化物薄膜的探討'Chemistry 60 (2002) 307-318. 2-17 R. W. Jones, The Institute of Metals (1990) 128. 2-18 B. Jirhennsons, M. E. Straumanis, Colloid Chemistry. New York. (1962). 2-19 C. Sanchez, J. Livage, J.Non-Cryst. Solids 145 (1992) 11-19. 2-20 J. Mackenzie, D. Ulrich, Ultrastructure Processing of Advanced Ceramics, New York (1988) 512-514. 2-21 C. Sanchez, J. Livage, M. Henry, F. Babonneau, J.Non-Cryst. Solids 100 (1988) 65-67. 2-22 G. Gasparro, J. Putz, D. Ganz, M.A. Aegerter, Solar Energy Materials and Solar Cells 54 (1998) 287-296. 2-23 Y. J. Lin, C. J. Wu, Surf. Coating Technol. 88 (1996) 239-244. 2-24 T. Furusaki, J. Takahashi, H. Takaha,k,Kodaira, J. Ceram. Society of Japan 101 (1992) 441-455. 2-25 B. Orel, U. Lavrencic-Stanger, Z. C. Orel, P. Bukovec, M. Kosec, J. Non-Cryst. Solids 167 (1994) 272-276. 2-26 J. P. Chatelon, C. Terrier, J.A. Roger, Thin Solid Films 295 (1997) 95-100. 2-27 J. P. Chatelon, C. Terrier, J.A. Roger, J. Sol-Gel Sci.Technol. 10 (1997) 75-81. 2-28 A. Maddalena, R. D. Malschio, S. Dire, A. Raccanelli, J. Non-Cryst. Solids121 (1990) 365-369. 2-29 S.C. Ray, M. K. Karanjai, D. D. Gupta, Surf. Coating Technol. 102 (1998) 73-80. 2-30 C. Nozaki, K. Tabata, E. Suzuki, J. Solid State Chem. 154 (2000) 579-583. 2-31 O.Yamamoto, T. Sasamoto, M. Inagaki, J. Mater. Res. 7 (1992) 2488-2491. 2-32 K. Nishio, T. Sei, T. Tsuchiya, J. Mater. Sci. 31 (1996) 1761-1766. 2-33 D. Gallagher, F. Scanlan, R. Houriet, H. J. Mathieu, T. A. Ring, J. Mater. Res. 8 (1993) 3135-3143. 2-34 T. Maruyama, A. Kojima, J. Appl. Phys. 27 (1988) 1829-1834. 2-35 S. S. Park, J. D. Mackenzie, Thin Solid Films 258 (1995) 268-273. 2-36 S. S. Park, H. Zheng, J. D. Mackenzie, Mater. Lett. 22 (1995) 175-180. 2-37 Y. Takahashi, Y. Wada, J. Electrochem. Soc. 137 (1990) 267-272. 2-38 P. Chatelon, C. J. Terrier, E. Bernstein, R. Berjoan, J. A. Roger, Thin Solid Films 247 (1994) 162-168. 2-39 A. Tsunashima, H. Yoshimizu, K. Kodaira, S. Shimada, T. Matsushita, J. Mater. Sci. 21 (1986) 2731-2734. 2-40 D. M. Mattox, Thin Solid Films 204 (1991) 25-32. 2-41 D. M. Mattox, Thin Solid Films 18 (1973) 173-186. 2-42 N. L. Wu, L. F. Wu, Y. C. Yang, S. J. Huang, J. Mater. Res. 11 (1996) 813-820. 2-43 J. C. Giuntini, W. Granier, J. V. Zanchetta, A. Taha, J. Mater. Sci. Lett. 9 (1990) 1383-1388. 2-44 M. Henry, J. P. Jolivet , J. Livage, Aqueous chemistry of metal cations: Hydrolysis, condensation and complexation (1992) 155-196 2-45 J. Mackenzie, D. Ulrich, Ultrastructure Processing of Advanced Ceramics, New York (1988) 623-628. 2-46 Y. Takahashi, S. Okada, R. B. H. Tahar, K. Nakano, T. Ban, Y. Ohya, J.Non-Cryst. Solids 218 (1997) 129. 2-47 J. Puetz, F. N. Chalvet, M. A. Aegerter, Thin Solid Films 442 (2003) 53-59 2-48 L. Landau, B. Levich, Acta Physicochim 17 (1942) 42. 2-49 楊淑梅，'以溶膠-凝膠程序製備無機複合膜之抗高溫氧化及防蝕性質研究 '，中原大學化學工程學系碩士學位論文 (2001). 2-50 L. E. Scriven, Mater. Res. Bull 121 (1988) 717-729. 2-51 C. P. Huang, Characterization of Thermally Cured and Laser Cured Sol-gel ITO Thin Films 碩士學位論文 (2009) 21. 2-52 C. J. R. Gonzalez-Oliver, I. Kato, J. Non-Cryst. Solids 82 (1986) 400. 2-53 M. A. Aegerte, A. Reich, D. Ganz, G. Gasparro, J. Putz, T. Krajewski, J. Non-Cryst. Solids 218 (1997) 123-128. 2-54 J. C. Viguie, J. Spitz, J. Electrochem. Soc.:Solid-State Sci.Technol. 122 (1975) 585-560. 2-55 N. Asakuma, T. Fukui, M. Toki, H. Imai, J. Sol-Gel Sci. Technol. 27 (2003) 91–95. 2-56 C. S. Sandu, V. S. Teodorescu, C. Ghica, P. Hoffmann, T. Bret, A. Brioude, M.G. Blanchin, J.A. Roger, B. Canut, M. Croitoru, J. Sol-Gel Sci. Technol. 28 (2003) 227-234. 2-57 T. Nagase, T. Ooie, J. Sakakibara, Thin Solid Films 357 (1999) 151-158. 2-58W. M. Tsang, F. L. Wong, M. K. Fung, J. C. Chang, C. S. Lee, S. T. Lee, Thin Solid Films 517 (2008) 891–895 2-59 M. J. Alam, D. C. Cameron, Thin Solid Films 420-421 (2002) 76-82. 2-60 M. J. Alam, D. C. Cameron, Thin Solid Films 400 (2000) 455-459. 2-61 R. Ota, S. Seki, M. Ogawa, T. Nishide, A. Shida, M. Ide, Y. Sawada, Thin Solid Films 411 (2002) 42-45. 2-62 E. Shigeno, K. Shimizu, S. Seki, M. Ogawa, A. Shida , M. Ide, Y. Sawada, ThinSolid Films 411 (2002) 56-59. 2-63 S. Seki, Y. Sawada, M. Ogawa, M. Yamamoto, Y. Kagota, A. Shida, M. Ide, Surf. Coating Technol. 169 –170 (2003) 525-527. 第三章 3-1 Conig Eagle 2000 material Information. 'http://www.corning.com/index.aspx'. 3-2 MSDS:Conig Eagle 2000F Glass. 'http://www.corning.com/index.aspx'. 3-3 C. P. Huang, Characterization of Thermally Cured and Laser Cured Sol-gel ITO Thin Films 碩士學位論文 (2009) 25-35 3-4 蔡裕榮,周禮君，'以溶膠凝膠法製備透明導電氧化物薄膜的探'，Chemistry 60 (2002) 307-318. 3-5 'http://www.zencatec.com/products01/Glastic_PES.htm'. 3-6 洪文進，'以溶膠凝膠法參混乙醯丙銅製備ITO透明導電膜及表面分析'，國 立台北科技大學有機高分子所碩士論文 (2006) 36 3-7 C. P. Huang, Characterization of Thermally Cured and Laser Cured Sol-gel ITO Thin Films 碩士學位論文 (2009) 43. 3-8 'http://hyperphysics.phy-astr.gsu.edu/hbase/hframe.html'. 3-9 Mast-tech.'http://www.mast-tech.com.tw' 3-10 L. J. van der PAUW, PHILIPS TECHNICAL REVIEW 26 (1958) 220-224.第四章 4-1 洪文進，'以溶膠凝膠法餐混以稀丙銅製備ITO透明導電膜及表面分析'，國 立台北科技大學有機高分子所碩士論文 (2006) 22 4-2 Y. Takahashi, S. Okada, R. B. H. Tahar, K. Nakano, T. Ban, Y. Ohya, J. Non-Cryst. Solids 218 (1997) 129-134. 4-3 蔡裕榮,周禮君，'以溶膠凝膠法製備透明導電氧化物薄膜的探'，Chemistry 60 (2002) 307-318. 4-4 N. Asakuma,T. Fukui,M. Toki,H. Imai, J. Sol-Gel Sci. Technol. 27 (2003) 91–95. | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/46811 | - |
| dc.description.abstract | 本論文以溶膠凝膠法製備透明導電ITO 薄膜，並探討熱處理與雷射處理之ITO 薄膜。實驗使用無水氯化銦與四氯化錫做為前驅物，探討分別使用乙醯丙酮與異丙醇兩種溶劑之結果，在回流裝置下加熱至70 度持溫3 小時，並與氯化銦溶液均勻混合，完成溶膠凝膠前驅液(precursor solution)的製備。在熱處理下，藉由異丙醇取代乙醯丙酮做為溶劑下可將電阻率從4.5x10-2 Ω-cm 降至1.6x10-2Ω-cm，在550nm 光波長下膜厚為100nm 之ITO 薄膜穿透率達90％。
本論文亦利用KrF 準分子雷射(波長248nm)低溫退火技術分別於玻璃與PES塑膠基板上嘗試製作ITO 薄膜。在玻璃基板上，雷射能量56mJ/cm2 發數28 發下有最低片電阻190Ω,電阻率1.79x10-2Ω･cm，穿透率在波長550nm 達87％(膜厚210nm)。而在塑膠基板上，雷射能量50 mJ/cm2 發數280 發下有最低片電阻750Ω,電阻率4.4 x10-2Ω･cm，穿透率在波長550nm 達81％(膜厚110~150nm)。並且從化學分析電子光譜儀(ESCA)分析中發現，烤乾溫度260 度下的碳含量在碳氧銦錫四種元素中佔10~15％，而烤乾溫度200 度下則占了23~52％。 | zh_TW |
| dc.description.provenance | Made available in DSpace on 2021-06-15T05:41:44Z (GMT). No. of bitstreams: 1 ntu-99-R97941078-1.pdf: 5846317 bytes, checksum: 1544ffff31c4d2e755e8ea71df35fed0 (MD5) Previous issue date: 2010 | en |
| dc.description.tableofcontents | 中文摘要 ..................................................................................................... I
Abstract ..................................................................................................................... II 誌謝 ........................................................................................................... III 圖目錄....................................................................................................................... VI 表目錄....................................................................................................................... IX 第一章緒論 .............................................................................................................. 1 1.1 前言.................................................................................................................. 1 1.2 研究動機.......................................................................................................... 2 1.3 論文架構.......................................................................................................... 3 第二章 理論與文獻回顧 .......................................................................... 4 2.1摻雜金屬之透明導電膜的文獻回顧 ............................................................ 4 2.2 ITO薄膜之電學性質 .................................................................................... 5 2.3 ITO薄膜之光學性質 .................................................................................... 6 2.4 溶膠-凝膠製備法 ......................................................................................... 8 2.5 前驅物的化學 ............................................................................................... 9 2.6 塗佈方法 ..................................................................................................... 13 2.7 低溫雷射退火之文獻回顧 ......................................................................... 15 2.8 不同ITO前驅溶液製備與成膜性質之回顧 ............................................. 16 第三章實驗方法 .................................................................................... 18 3.1 基板的準備 .................................................................................................. 18 3.2 前驅液的製備 .............................................................................................. 19 3.3 實驗流程....................................................................................................... 20 3.3.1 熱退火製程................................................................................ 20 3.3.2 雷射退火製程............................................................................ 21 3.4 分析儀器及方法 .......................................................................................... 22 3.4.1 X 光能量散布儀器(EDS) .......................................................... 25 3.4.2 化學分析電子光譜儀(ESCA) .................................................... 25 3.4.3 Alpha-step 表面輪廓儀 ............................................................. 26 3.4.4 X 射線繞射儀(XRD) ................................................................. 26 3.4.5 掃描式電子顯微鏡(SEM) .......................................................... 27 3.4.6 四點探針電阻量測儀................................................................. 27 3.4.7 霍爾效應量測儀(Van der Pauw method) ................................... 28 第四章結果與討論 ................................................................................ 30 4.1 以乙醯丙酮為溶劑之前驅液所製備之ITO 薄膜 ...................................... 30 4.1.1 熱退火之ITO 薄膜(on glass) .................................................... 30 4.1.2 雷射退火之ITO 薄膜 (on glass) .............................................. 33 4.2 以異丙醇為溶劑之前驅液所製備之ITO薄膜 ......................................... 37 4.2.1 熱退火之ITO 薄膜 .................................................................... 37 4.2.2 雷射退火之ITO 薄膜 ................................................................ 41 4.2.2.1 雷射能量的影響.............................................................. 42 4.2.2.2 雷射發數的影響.............................................................. 52 4.2.2.3 總能量與雷射發數時間間距的影響.............................. 65 第五章結論與未來展望 ........................................................................ 65 5.1 結論................................................................................................................ 67 5.2 未來展望........................................................................................................ 67 參考文獻...................................................................................................................... 68 | |
| dc.language.iso | zh-TW | |
| dc.subject | 溶膠凝膠 | zh_TW |
| dc.subject | 雷射 | zh_TW |
| dc.subject | 透明島電膜 | zh_TW |
| dc.subject | TCO | en |
| dc.subject | sol-gel | en |
| dc.subject | laser | en |
| dc.title | 以KrF準分子雷射處理與熱退火溶膠凝膠法製備之ITO透明導電膜特性分析 | zh_TW |
| dc.title | Characterization of KrF Excimer Laser Cured and
Thermally Cured Sol-gel ITO Thin Films | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 98-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.advisor-orcid | ,陳建彰(jchen@ntu.edu.tw) | |
| dc.contributor.oralexamcommittee | 吳育任(Yuh-Renn Wu),吳志毅(Chih-I Wu),楊木榮(Mu-Rong Yang) | |
| dc.subject.keyword | 雷射,溶膠凝膠,透明島電膜, | zh_TW |
| dc.subject.keyword | laser,sol-gel,TCO, | en |
| dc.relation.page | 72 | |
| dc.rights.note | 有償授權 | |
| dc.date.accepted | 2010-08-26 | |
| dc.contributor.author-college | 電機資訊學院 | zh_TW |
| dc.contributor.author-dept | 光電工程學研究所 | zh_TW |
| 顯示於系所單位： | 光電工程學研究所 | |
文件中的檔案：
| 檔案 | 大小 | 格式 | |
|---|---|---|---|
| ntu-99-1.pdf 未授權公開取用 | 5.71 MB | Adobe PDF |
系統中的文件，除了特別指名其著作權條款之外，均受到著作權保護，並且保留所有的權利。