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http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/4617完整後設資料紀錄
| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 徐振哲(Cheng-Che Hsu) | |
| dc.contributor.author | Wei-Shang Zseng | en |
| dc.contributor.author | 曾暐升 | zh_TW |
| dc.date.accessioned | 2021-05-14T17:44:11Z | - |
| dc.date.available | 2020-07-31 | |
| dc.date.available | 2021-05-14T17:44:11Z | - |
| dc.date.copyright | 2015-07-31 | |
| dc.date.issued | 2015 | |
| dc.date.submitted | 2015-07-30 | |
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| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/4617 | - |
| dc.description.abstract | 本研究利用介質放電系統進行粉體之表面披覆，不同型態的電漿能藉由不同的實驗架設及操作參數來形成。介電質放電系統是將至少一層介電質放置於上下電極之間來完成電漿的產生。當前驅物進入電漿系統後，會產生裂解並披覆於粉體表面，本實驗利用不同的實驗設置、前驅物及主粉體來完成粉體的披覆。
首先本研究以乙炔為前驅物進行鋰錳鎳氧粉體以及二氧化矽粉體的表面碳膜披覆，利用電漿進行批覆後以高溫爐進行熱處理，可發現其導電度有明顯的上升，並且利用拉曼光譜儀可看見粉體表面有明顯的G-peak及D-peak，表示我們於粉體表面完成非完美石墨之碳披覆。 其後我們以TEOS作為前驅物進行二氧化矽之表面披覆，本研究先後於氧化鋅及二氧化鈦表面進行二氧化矽薄膜披覆，由傅立葉轉換紅外線光譜儀可得知我們所批覆之二氧化系為有機的類二氧化矽薄膜。並且氧化鋅粉體於二氧化矽批覆後其UV段之發光性質有明顯增益，並且我們可以利用不同的前處理來改變其發光增益之波段。 最後我們以八氟環丁烷 (C4F8) 做為前驅物進行粉體表面的類鐵氟龍薄膜披覆，我們以二氧化鈦及二氧化矽等親水粉體做為主粉體進行批覆。於進行類鐵氟龍薄膜批覆後其親疏水性皆有明顯的改變。 並且我們發現，在流體化床當中，粉體的流體化能夠讓粉體被能夠被均勻的批覆並且使得奈米粉體聚集體被破壞，使粉體的行為更接近真實的奈米顆粒。 | zh_TW |
| dc.description.abstract | In this work, we synthesize core-shell nanoparticles with different precursor and particles by an ultra-fast, one-step, dry, and atmospheric-pressure plasma fluidized bed process.
Plasma-enhanced chemical vapor deposition (PECVD) has been widely used for thin film surface treatment and surface modification. However, PECVD is difficult to treat particles due to some problem like non-uniform coating and particle agglomeration. The fluidized bed technology has some advantage to treating; for example, well solid mixing and breakage of agglomeration. First, we coating carbon film with different particle acetylene (C2H2) by as carbon source. The conductivity of coated particle is in significantly enhancement after dihydrogen process. Then the SiOx film have been coated with Tetraethyl orthosilicate (TEOS) as precursor. An improved ultraviolet (UV) to visible luminescence (better than pure ZnO nanoparticles) was observed from ZnO/SiO2 core-shell nanoparticles by Fluorescence Spectrophotometer. The particles are well-dispersed in ethanol after silica coating due to the increase of zeta potential and breakage of agglomeration. At last, we use Octafluorocyclobutane (C¬4F8) as precursor to coat Teflon-like film on SiO2 and TiO2 particles. The hydrophilicity of host particle changed significantly after coating. We believe this fabrication technique brings impact to the field of photocatalysis, battery and emitting device. | en |
| dc.description.provenance | Made available in DSpace on 2021-05-14T17:44:11Z (GMT). No. of bitstreams: 1 ntu-104-R02524089-1.pdf: 3222656 bytes, checksum: 3c41d18fdac0986b335e38ed4521f77c (MD5) Previous issue date: 2015 | en |
| dc.description.tableofcontents | 口試委員審定書 I
中文摘要 II 英文摘要 III 目錄 IV 圖目錄 VI 表目錄 IX 第一章 緒論 1 1.1前言 1 1.2研究動機 1 1.3論文總覽 2 第二章 文獻回顧 3 2.1 常壓電漿簡介 3 2.2 粉體表面披覆及改質之目的 6 2.2.1 改變粉體的電性 6 2.2.2改變粉體的分散性及流動性 11 2.2.3 改變粉體的親疏水性 16 2.2.3 流體化床形式的電漿輔助化學氣象沉積之於粉體披覆 21 2.3 粉體表面改質技術 22 2.3.1 固相反應 22 2.3.2 液相反應 26 2.3.3 氣相反應 30 2.4氧化鋅簡介 32 2.4.1光學性質 32 2.4.2 氧化鋅複合材料 33 2.5 儀器原理介紹 39 第三章 實驗設備與架構............................................................................................43 3.1 實驗設備之演進 43 3.1.1 噴動式流體化床常壓介電質放電系統裝置 43 3.1.2 上方進氣式噴動式流體化床常壓介電質放電系統 44 3.1.3 上方進氣式噴動式流體化床粉體輔助常壓放電系統 45 3.1.4 脈衝模式 (pulse mode) 45 3.1.5 電漿之性質檢測 46 3.2粉體披覆之檢測分析設備 50 第四章 實驗結果與討論 53 4.1利用噴動式流體化床進行氧化鋅之碳披覆 53 4.2利用噴動流體化床形式的電漿輔助化學氣相沉積進行鋰錳鎳氧之碳披覆 57 4.3利用噴動式流體化床形式的電漿輔助化學氣相沉積進行二氧化鈦的二氧化矽披覆 60 4.4利用噴動式流體化床形式的電漿輔助化學氣相沉積進行氧化鋅之二氧化矽披覆 65 4.5利用上方進氣的噴動式流體化床形式的電漿輔助化學氣相沉積進行氧化鋅之二氧化矽披覆 72 第五章 結論與未來展望 82 第六章 參考文獻 84 | |
| dc.language.iso | zh-TW | |
| dc.title | 利用流體化床形式的電漿輔助化學氣相沉積進行粉體表面之薄膜沉積 | zh_TW |
| dc.title | Material Coating on Powder Surfaces by Dielectric Barrier Discharge at Atmospheric Pressure | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 103-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 林致廷(Chih-Ting Lin),康敦彥(Dun-Yen Kang),許聿翔(Yu-Hsiang Hsu) | |
| dc.subject.keyword | 奈米粉體,披覆,流體化床,電漿,介電質放電, | zh_TW |
| dc.subject.keyword | nano-particels,coating,plasma,DBD,fluidized bed, | en |
| dc.relation.page | 91 | |
| dc.rights.note | 同意授權(全球公開) | |
| dc.date.accepted | 2015-07-31 | |
| dc.contributor.author-college | 工學院 | zh_TW |
| dc.contributor.author-dept | 化學工程學研究所 | zh_TW |
| 顯示於系所單位： | 化學工程學系 | |
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