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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 楊申語(Sen-Yeu Yang) | |
dc.contributor.author | Tzu-Chien Huang | en |
dc.contributor.author | 黃子健 | zh_TW |
dc.date.accessioned | 2021-06-15T00:21:40Z | - |
dc.date.available | 2010-02-12 | |
dc.date.copyright | 2009-02-12 | |
dc.date.issued | 2009 | |
dc.date.submitted | 2009-02-03 | |
dc.identifier.citation | 參考文獻
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dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/41524 | - |
dc.description.abstract | 滾輪壓印是目前最能夠高速且連續製作微結構成型之製程,但目前微結構滾輪在常使用鎳膜包覆與軟模包覆,使用包覆模具法雖可得到滾輪表面結構,但連續加工性受到侷限。使用精密單晶鑽石加工,能製作之微結構外型種類較少;而使用電子束或X-Ray等高能量束直寫於滾輪上,加工時間長、而且昂貴。本研究開發一直接於金屬滾輪上製作微結構之滾輪製程。
本研究應用滾輪角度分度達到步進式曝光,並進行無電鍍鎳,直接在長度120 mm、外徑80 mm之鋁合金滾輪上製作微結構。滾輪基材以精密單晶鑽石車削,使表面粗度達到10-20 nm Ra,接著無電鍍鎳於滾輪表面,得到表面為鎳基之滾輪。接著在滾輪表面塗佈EPG510之負型光阻、以角度分度步進曝光顯影,最後無電鍍鎳製作結構。本研究首先研究光阻塗佈於滾輪表面的製程,探討使用浸潤式塗佈、浸潤式旋轉塗佈、直接噴霧式塗佈與靜電式噴霧塗佈不同製程的膜厚與參數。使用各種塗佈方式塗佈EPG510光阻於滾輪表面上,可得到之厚度分別為: 噴霧式直接塗佈膜厚3.1-6.3 μm、旋轉浸潤式塗佈膜厚400-1050 nm、浸潤式70-600 nm。最薄方式為靜電式噴霧塗佈,膜厚在24-100 nm之間。 接著探討使用45 μm、 23 μm 、11.6 μm等不同寬度直線光罩曝光,由步進分度控制周期,當步進角度為1/12度與1/6度時,可於滾輪表面製作週期116.32 μm 與58.18 μm之結構。無電鍍鎳製作鎳微結構於滾輪表面,可藉由無電鍍時間控制微結構高度。使用寬度45 μm光罩可製作出平均高度0.96 μm、結構寬度23 μm光罩製作平均高度1.065 μm 、結構寬度11.6 μm光罩製作平均高度0.342 μm連續直線微結構於滾輪表面。 | zh_TW |
dc.description.abstract | Roller embossing has attracted more attention due to its rapid, continuous nature; it is especially good for mass production. The fabrication of microstructure rollers is the key technology. Most of the microstructure rollers fabrication methods are very complicated and costly, employing high-end facilities. Furthermore, mold sliding and warping problems are frequently encountered because of the weak adhesion between molds and rollers. Soft rollers with microstructures have problems such as poor strength durability and temperature endurance.
This work proposes a novel fabrication method of roller mold with microstructure on the surface using stepped rotating lithography and electroless nickel plating. First of all, the photoresist is coated onto the roller surface using three methods: dip coating, rotatory dip coating and electrostatic coating. Then the photoresist on the roller surface is patterned using stepped rotating lithography, followed by developing. The roller is subsequently treated with electroless nickel plating. Finally, the residual photoresist is removed. A roller with rigid nickel microstructures can be obtained. It was found that the thickness of PR coating on roller are 400-1050 nm using rotatory dip coating, 70-600 nm using dip coating, and 24-100 nm using electrostatic coating. Results prove that the microstructures can be successfully fabricated onto the metal roller using proposed stepped rotating lithography and electroless nickel plating. In addition, the microstructures with various pitches on single metal roller also can be fabricated by adjusting the rotating degree of stepped rotating lithography. | en |
dc.description.provenance | Made available in DSpace on 2021-06-15T00:21:40Z (GMT). No. of bitstreams: 1 ntu-98-D93522008-1.pdf: 10851583 bytes, checksum: 17e840742c6beaa3a69c3758f64dda7f (MD5) Previous issue date: 2009 | en |
dc.description.tableofcontents | 目錄
誌謝 I 摘要 III ABSTRACT V 目錄 VII 圖目錄 XI 表目錄 XVII 第一章 導 論 1 1.1 LIGA技術 1 1.2 滾輪壓印成型 2 1.3 滾壓複製微結構 2 1.4 研究動機與目的 3 1.5 研究預期成果 4 1.6 論文架構 4 第二章 文獻回顧 7 2.1 光阻塗佈 7 2.2 微結構滾輪壓印複製成型技術 8 2.2.1 滾輪應用於熱壓微成型 8 2.2.2 滾輪應用於軟微影文獻回顧 9 2.2.3 滾輪應用於UV固化微成型文獻回顧 9 2.2.2 類LIGA製程 10 2.3 微結構滾輪製作之相關文獻 11 2.4 整體回顧總結與研究創新 12 第三章 實驗設備與初步實驗 24 3.1 滾輪光阻塗佈機台 24 3.1.1 滴入式滾輪塗佈機台 24 3.1.2 噴霧式塗佈機台 25 3.1.3 浸潤式旋轉塗佈機台 25 3.1.4靜電式旋轉塗佈機台 26 3.2 滾輪膜厚量測載台與滾輪曝光機台 26 3.3 相關之量測設備 27 3.3.1 光譜與膜厚量測儀 27 3.3.2 材料測試儀器 27 3.3.3 光強計 27 3.3.4 微結構輪廓量測 27 3.4 實驗設計法 28 3.5 初步實驗 28 3.5.1 光阻黏度測試 28 3.5.2 表面能測試 29 3.5.3 光波長與光強度實驗 29 3.5.4 膜厚量測驗正與比對 30 3.5.5 無電鍍法製作微結構於滾輪流程訂定 31 3.6 本章結論 32 第四章 光阻塗佈於滾輪表面 52 4.1 浸潤式塗佈法 52 4.1.1 浸潤式旋轉塗佈實驗參數訂定 52 4.1.2 浸潤塗佈實驗 54 4.1.3 浸潤式旋轉塗佈實驗 56 4.2 靜電式旋轉塗佈法 59 4.2.1 靜電塗佈原理 59 4.2.2 靜電塗佈電場分析 60 4.2.3 靜電塗佈氣體流場分析 60 4.2.4 靜電塗佈實驗 61 4.3 本章結論 62 第五章 滾輪製作 93 5.1 曝光誤差 93 5.1.1 投影誤差 93 5.1.2 分度時產生之誤差 94 5.1.3 滾輪表面光反射誤差 94 5.1.4 其他誤差 95 5.2 滾輪基材與加工 96 5.3 滾輪表面光阻曝光 96 5.3.1 乾膜光阻定義滾輪結構 96 5.3.2 濕式光阻定義滾輪結構 97 5.4 滾輪結構製作 98 5.5 本章結論 99 第六章 滾輪壓印製程 115 6.1 押出成形 115 6.1.1 連續周期之曲面結構押出 115 6.1.2 含有擴散劑之連續周期之曲面結構押出 116 6.2 UV壓印成形 117 6.3 壓印製成結論 118 第七章 結論與未來展望 129 7.1 結論 129 7.1.1滾輪表面光阻塗佈 129 7.1.2滾輪表面微結構製作 130 7.1.3滾輪壓印 130 7.2 原始貢獻 130 7.3 未來展望與方向 131 參考文獻 135 附錄A 滴入式滾輪塗佈實驗 142 A.1 滾輪水平式旋轉 142 A.2 滾輪直立式旋轉 142 附錄B 噴霧式旋轉塗佈法 149 附錄C 滾輪真圓度 153 附錄D 著作 155 | |
dc.language.iso | zh-TW | |
dc.title | 應用光阻與角度步進光微影於滾輪表面製作無電鍍鎳微結構 | zh_TW |
dc.title | Direct fabrication of microstructures on metal roller using stepped rotating lithography and electroless nickel plating | en |
dc.type | Thesis | |
dc.date.schoolyear | 97-1 | |
dc.description.degree | 博士 | |
dc.contributor.oralexamcommittee | 沈永康,張復瑜,陳炤彰,黃仁清,劉士榮,蔡曜陽 | |
dc.subject.keyword | 滾輪壓印,微結構,光阻塗佈,無電鍍鎳, | zh_TW |
dc.subject.keyword | Roller Imprint,Microstructures,PR Coating,electroless nickel plating, | en |
dc.relation.page | 159 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2009-02-04 | |
dc.contributor.author-college | 工學院 | zh_TW |
dc.contributor.author-dept | 機械工程學研究所 | zh_TW |
顯示於系所單位: | 機械工程學系 |
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