請用此 Handle URI 來引用此文件:
http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/39355
完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 徐治平 | |
dc.contributor.author | Tzu-Hsuan Wei | en |
dc.contributor.author | 韋子璿 | zh_TW |
dc.date.accessioned | 2021-06-13T17:26:41Z | - |
dc.date.available | 2005-01-27 | |
dc.date.copyright | 2005-01-27 | |
dc.date.issued | 2005 | |
dc.date.submitted | 2005-01-12 | |
dc.identifier.citation | [1] K. D. Wise, “Special issue on integrated sensors, microactuators, and microsystems (MEMS)”, Proceedings of the IEEE 86 (1998) 1531-1533.
[2] H. Löwe, W. Ehrfeld, ‘‘State-of-the-art in microreaction technology: concepts, manufacturing and applications”, Electrochimica Acta 21-22 (1999) 3679-3689 [3] K. F. Jensen, ‘‘The impact of MEMs on the chemical and pharmaceutical industries’’, Solid-State Sensor and Actuator Workshop, June 4-8, 2000, 105-110. [4] A. Manz, H. Becker, Microsystem Technology in Chemistry and Life Science, Springer-Verlag, New York, 1998. [5] R. Srinivasan, I. M. Hsing, P. E. Berger, S. Firebaugh, K. F. Jensen, M. A.Schmidt, “Micromachined chemical reactors for heterogeneous catalytic partial oxidation reactions”, AIChE. J. 43 (1997) 3059-3069. [6] I. M. Hsing, R. Srinivasan, M. P. Harold, K. F. Jensen, M. A. Schmidt, ‘‘Simulation of micromachined chemical reactors for heterogeneous partial oxidation reactions’’, Chem. Eng. Sci. 55 (2000) 3-13. [7] M. Abraham, W. Ehrfeld, V. Hessel, K. P. Kamper, M. Lacher, A. Picard, “Microsystem technology: between research and industrial application”, Microelectronic Eng. 41/42 (1998) 47-52. [8] K. F. Jensen, ‘‘Microreaction engineering-is small better?’’, Chem. Eng. Sci. 56 (2001) 293-303. [9] P. Claus, D. Hönicke, T. Zech, “Miniaturization of screening devices for the combinatorial development of heterogeneous catalysts”, Cat. Today 67 (2001) 319-339 [10] G. Veser, “Experimental and theoreticalinvestigation of H2 oxidation in a high-temperature catalytic microreactor”, Chem. Eng. Sci. 56 (2001) 1265-1273 [11] E.V. Rebrov, M.H.J.M. de Croon, J.C. Schouten, “Development of the kinetic model of platinum catalyzed ammonia oxidation in a microreactor”, Chem. Eng. J. 90 (2002) 61–76 [12] O. Levenspeil, Chemical Reaction Engineering, 2nd ed, Wiley, New York, 1972. [13] G. F. Froment, K. B. Bischoff, Chemical Reactor Analysis and Design, 2nd ed, Wiley, New York, 1990. [14] H. S. Fogler, Elements of Chemical Reaction Engineering, 3rd ed, Prentice Hall, New Jersey, 1999. [15] A. D. Martin, “Interpretation of residence time distribution data”, Chem. Eng. Sci. 55 (2000) 5907-5917. [16] A. T. Harris, J. F. Davidson, R. B. Thorpe, “Particle residence time distributions in circulating fluidised beds”, Chem. Eng. Sci. 58 (2003) 2181-2202. [17] A. T. Harris, J. F. Davidson, R. B. Thorpe, “The influence of the riser exit on the particle residence time distribution in a circulating fluidised bed riser”, Chem. Eng. Sci. 58 (2003) 3669-3680. [18] K. L. Levien, O. Levenspiel, “Optimal product distribution from laminar flow reactors: Newtonian and other power-law fluids”, Chem. Eng. Sci. 54 (1999) 2453-2458 . [19] D. Burgreen, F. R. Nakache, ‘‘Electrokinetic flow in ultrafine capillary slits’’, J. Phy. Chem. 68 (1964) 1084-1091 [20] C. L. Rice, R. Whitehead, ‘‘Electrokinetic flow in a narrow cylindrical capillary’’, J. Phy. Chem. 69 (1966) 4017-4024 [21] T. S. Sørensen, J. Koefoed, “Electrokinetic effects in charged capillary tubes”, J. Chem. Soc. Faraday Trans. 270 (1974) 665-675. [22] S. C. Jacobson, J. M. Ramsey, ‘‘Electrokinetic focusing in microfabricated channel structures’’, Anal. Chem. 69 (1997) 3212-3217. [23] N. A. Patankar, H. H. Hu, ‘‘Numerical simulation of electroosmotic flow’’, Anal. Chem. 70 (1998) 1870-1881. [24] S. V. Ermak, S. C. Jacobson, J. M. Ramsey, ‘‘Computer simulations of electrokinetic transport in microfabricated channel structures’’, Anal. Chem. 70 (1998) 4494-4504. [25] E. B. Cummings, S. K. Griffiths, R. H. Nilson, P. H. Paul, ‘‘Conditions for similitude between the fluid velocity and electric field in electroosmotic flow’’, Anal. Chem. 72 (2000) 2526-2532. [26] S. V. Ermakov, S. C. Jacobson, J. M. Ramsey, ‘‘Computer simulations of Electrokinetic injection techniques in microfluidic devices’’, Anal. Chem. 72 (2000) 3512-3517. [27] S. L R. Barker, D. Ross, M. J. Tarlov, M. Gaitan, L. E. Locascio, ‘‘Control of flow direction in microfluidic devices with polyelectrolyte multilayers’’, Anal. Chem. 72 (2000) 5925-5929 . [28] M. J. Mitchell, R. Qiao, N. R. Aluru, ‘‘Meshless analysis of steady-state electro-osmotic transport’’, J. Microelectromechanical Sys. 9 (2000) 435-449. [29] F. Bianchi, R. Ferrigno, H. H. Girault, ‘‘Finite element simulation of an electroosmotic-driven flow division at a T-junction of microscale dimensions’’, Anal. Chem. 72 (2000) 1987. [30] S. C. Jacobson, T. E. Mcknight, J. M. Ramsey, ‘‘Microfluidic devices for electrokinetically driven parallel and serial mixing’’, Anal. Chem. 71 (1999) 4455-4459. [31] L. Ren, D. Li, W. Qu, ‘‘Electro-viscous effects on liquid flow in microchannels’’, J. Colloid Interface Sci. 233 (2001) 12-22. [32] P. Takhistov, K. Duginova, H. C. Chang, ‘‘Electrokinetic mixing vortices due to electrolyte depletion at microchannel junctions’’, J. Colloid Interface Sci. 263 (2003) 133-143. [33] A. Ajdari, ‘‘Transverse electrokinetic and microfluidic effects in micropatterned channels: lubrication analysis for slab Ggeometries’’, Phys. Rev. E 65 (2001) 016301-1-016301-9. [34] J. M. MacInnes, ‘‘Computation of reacting electrokinetic flow in microchannel geometries’’, Chem. Eng. Sci. 57 (2002) 4539-4558. [35] J. H. Masliyah, Electrokinetic Transport Phenomena, AOSTRA, Canada, 1994. [36] Compaq Visual Fortran, Version 6.5, Compaq Computer Corporation, USA [37] S. C. Chapra, R. P. Canale, Numerical Methods for Engineers, McGraw-Hill Inc., USA, 1994 | |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/39355 | - |
dc.description.abstract | 本文分析及推導圓形微管中電滲透流的滯留時間函數分佈。微管表面維持固定表面電位,以外加電場驅動反離子造成管中流動。藉由探討無因次電雙層厚度、外加軸向電場、外加軸向壓降等參數,探討電滲透流速度及滯留時間分佈函數的變化。本文目的在於深入瞭解電動力在微反應器中的應用,並提供反應器設計上的資訊,且滯留時間函數分佈對分析反應轉化率有極大幫助。數值模擬結果顯示電雙層厚度、外加電場及壓降越大會使電滲透流速度越快,縮短滯留時間,並使滯留時間分佈圖形改變。使用laminar flow及plug flow做為電雙層極厚及極薄時的類比,檢驗此兩種特殊情況下的滯留時間函數分佈,並推測極限值。 | zh_TW |
dc.description.provenance | Made available in DSpace on 2021-06-13T17:26:41Z (GMT). No. of bitstreams: 1 ntu-94-R91524084-1.pdf: 554193 bytes, checksum: 105a33669930735fe6ec179ee3972e2c (MD5) Previous issue date: 2005 | en |
dc.description.tableofcontents | 中文摘要 I
英文摘要 II 目錄 III 圖目錄 Ⅳ 表目錄 Ⅴ 第一章 緒論 1 第二章 文獻回顧 4 2.1 非理想流動之滯留時間分佈 2.1.1 滯留時間分佈測量 2.1.2 滯留時間分佈特性 2.2 膠體表面之帶電性質 2.3 電雙層理論 2.4 波松-波茲曼方程式 2.5 Debye-Huckel理論 2.6 Gouy-Chapman理論 2.7 電動力學現象 2.8 電泳理論 2.9 電滲透理論 第三章 理論分析 15 3.1 理論系統模型 3.2 圓管中的電位分佈 3.3 圓管中的流體速度分佈 3.4 滯留時間分佈函數 3.4.1 滯留時間函數分佈,不考慮壓降 3.4.2 滯留時間函數分佈,考慮壓降 3.5 電滲透流與壓力流的類比關係 3.5.1 速度分佈 3.5.2 滯留時間分佈 3.6 滯留時間與反應轉化率之關係 第四章 結果與討論 25 第五章 結論 30 符號說明 31 參考文獻 36 | |
dc.language.iso | zh-TW | |
dc.title | 圓柱型微反應器之滯留時間分佈 | zh_TW |
dc.type | Thesis | |
dc.date.schoolyear | 93-1 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 李克強,曾琇瑱 | |
dc.subject.keyword | 滯留時間分佈,圓柱型微反應器,電滲透流, | zh_TW |
dc.subject.keyword | Residence time distribution,electroosmotic flow,cylindrical microreactor, | en |
dc.relation.page | 50 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2005-01-17 | |
dc.contributor.author-college | 工學院 | zh_TW |
dc.contributor.author-dept | 化學工程學研究所 | zh_TW |
顯示於系所單位: | 化學工程學系 |
文件中的檔案:
檔案 | 大小 | 格式 | |
---|---|---|---|
ntu-94-1.pdf 目前未授權公開取用 | 541.2 kB | Adobe PDF |
系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。