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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 楊英杰 | |
dc.contributor.author | Kuan-Ming Chen | en |
dc.contributor.author | 陳冠銘 | zh_TW |
dc.date.accessioned | 2021-06-13T17:24:23Z | - |
dc.date.available | 2005-02-04 | |
dc.date.copyright | 2005-02-04 | |
dc.date.issued | 2005 | |
dc.date.submitted | 2005-01-26 | |
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dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/39212 | - |
dc.description.abstract | 從二十世紀初,許多重要的半導體製程技術陸續被開發出來;同時,隨著自動化工業技術的日趨成熟,不僅改善製程元件的可靠度,亦把半導體工業也帶入了另一個紀元。然而,所有的製程技術的發展通常多著墨於矽半導體的材料特性的研究;近幾年來,國內光電產業的產值逐年急遽增加,關於化合物半導體特性的研究才陸續被深入探討與研究。
半導體工業的持續成長,製程成本與研發經費的控管扮演著一個關鍵性的角色,然而雷射二極體元件的生產良率卻因III-V族化合物材料製程技術不穩定而無法提升,不僅增加了製造成本,也間接降低了企業的競爭力。本論文的研究目的係為有效地提高雷射二極體元件可靠度,並以III-V族化合物材料成分組成的垂直共振腔面射型雷射元件作為研究對象,將特別針對雷射二極體元件基本結構及運作原理,進行個別的製程研究與探討,期以能提供相關的結果與經驗,運用在各類雷射二極體元件的製作。 | zh_TW |
dc.description.provenance | Made available in DSpace on 2021-06-13T17:24:23Z (GMT). No. of bitstreams: 1 ntu-94-P91943012-1.pdf: 1035089 bytes, checksum: 2027840ea06b08a3411aa1a4dcb0a33f (MD5) Previous issue date: 2005 | en |
dc.description.tableofcontents | 第一章 緒論 1
1.1 簡介 1 1.2 垂直共振腔面射型雷射 3 1.3 垂直共振腔面射型雷射侷限電流模式 5 1.4 雷射二極體元件的光電特性量測 7 第二章 鋅擴散對VCSEL的影響 10 2.1 鋅擴散簡介 10 2.2 鋅擴散模擬與實驗 12 2.2.1 鋅擴散模擬與實驗 12 2.2.2 鋅擴散對面射型雷射臨界增益的影響 13 2.3 實驗方法與設備 15 2.4 鋅擴散的實驗與結果 19 第三章 離子佈植式面射型雷射 20 3.1 離子佈植簡介 20 3.2 離子佈植實驗模擬 23 3.3 離子佈植製作步驟 27 3.4 離子佈植式面射型雷射的光電特性 34 3.4.1 不同鋅擴散深度之離子佈植式面射型雷射LIV曲線 34 3.4.2 離子佈植式面射型雷射遠場發散角及頻譜量測圖 37 第四章 氧化侷限式面射型雷射 39 4.1.1 選擇性水氣氧化法簡介 39 4.1.2 水氧化機制 40 4.2 水氣氧化實驗模擬 42 4.3 製作步驟 43 4.4 水氧化面射型雷射的光電特性 50 4.4.1 水氧化面射型雷射LIV曲線 50 4.4.2 水氧化面射型雷射遠場發散角及頻譜量測圖 51 第五章 結果討論與未來展望 53 5.1 鋅擴散 53 5.2 面射型雷射二極體特性 55 5.3 未來展望 56 參考資料 57 | |
dc.language.iso | zh-TW | |
dc.title | 雷射二極體製程之研究 | zh_TW |
dc.title | The Study of Laser Diode Process | en |
dc.type | Thesis | |
dc.date.schoolyear | 93-1 | |
dc.description.degree | 碩士 | |
dc.contributor.oralexamcommittee | 王維新,余岳仲 | |
dc.subject.keyword | 雷射二極體,離子佈植,鋅擴散,選擇性水氧化, | zh_TW |
dc.subject.keyword | ion implantation,Laser diode,znic diffusion,oxidation, | en |
dc.relation.page | 61 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2005-01-27 | |
dc.contributor.author-college | 電機資訊學院 | zh_TW |
dc.contributor.author-dept | 電子工程學研究所 | zh_TW |
顯示於系所單位: | 電子工程學研究所 |
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