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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 蔡定平(Din Ping Tsai) | |
dc.contributor.author | Wei-Chih Lin | en |
dc.contributor.author | 林威志 | zh_TW |
dc.date.accessioned | 2021-06-13T16:30:51Z | - |
dc.date.available | 2010-07-12 | |
dc.date.copyright | 2005-07-12 | |
dc.date.issued | 2005 | |
dc.date.submitted | 2005-07-12 | |
dc.identifier.citation | [1 1] M. Born, E. Wolf. Principles of Optics, Oxford: Pergamon, 81-84 (1959)
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Phys. 38, .L322 (1999). [4 7] J. Tominaga, H. Fuji, T. Nakano, L. Men, N. Atoda, Second Asia-Pacific Workshop on Near-field Optics, Beijing, October 20-23, 1999 [4 8] T. Shima, and J. Tominaga, J. Vac. Sci. Technol. A, 21, 634 (2003). [4 9] A. V. Kolobov, D. Buechel, P. Fons, T. Shima, M. Kuwahara, J. Tominaga and T. Uruga, Jpn. J. Appl. Phys. 42,1022 (2003). [4 10] A. V. Kolobov, A. Rogalev, F. Wilhelm, N. Jaouen, T. Shima, and J. Tominaga, Appl. Phys. Lett. 84, 1641 (2004). [4 11] W. C. Liu, C. Y. Wen, K. H. Chen, W. C. Lin, D. P. Tsai, Appl. Phys. Lett. 78, 685 (2001). [4 12] D. P. Tsai, C. W. Yang, S. Z. Lo, H. E. Jackson, Appl. Phys. Lett. 75, 1039 (1999). [4 13] W. C. Lin, J. D. Su, M. C. Tsai, D. P. Tsai, N. H. Lu, H. J. Huang, W. Y. Lin, Optical Engineering for Sensing and Nanotechnology, SPIE Proc., 4416, 231(2001). [4 14] W. C. Lin, T. S. Kao, H. H. Chang, Y. H. Lin, Y. H. Fu, D. P. Tsai, C. Y. Wen, K. H. Chen, Jpn. J. Appl. Phys. 42, 1029(2003). [4 15] W. C. Lin, F. H. 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P. Tsai, J. of Vac. Sci. and Tech., in press (2005). | |
dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/38339 | - |
dc.description.abstract | 本論文的主要工作在於研究超分辨近場結構光碟片之所以具有可解析繞射極限尺寸以下之記錄點能力的原因,以及隱含在其中的物理作用及問題。首先藉由射頻反應濺鍍技術(RF reactive sputtering)實際製作不同結構之超分辨近場光碟片,並利用穿遂式電子顯微鏡(transmission electron microscope, TEM)及掃瞄式電子顯微鏡(scanning electron microscope, SEM)觀察並監測在不同參數下所製作出之超分辨近場結構的異同,同時針對不同參數所製作出的超分辨近場結構,進行近場及遠場光學的量測與研究。在近場光學的研究當中,我們發現超分辨近場結構在近場中具有非線性光學性質,而此性質的起因是由於侷域性表面電漿子增強效應(localized surface plasmon enhancement)所造成的。了解超分辨近場碟片的主要工作機制後,我們便嘗試利用不同的材料及結構,以期能製作出具有更佳讀寫特性之超分辨近場光碟,在本論文中,我們提出採用氧化鋅(ZnOx)作為新一代近場光碟片的主要作用層,具有結構安定及高讀取載子雜訊比(carrier to noise ratio, CNR)等優點,除此之外,我們也利用商用的DVD光碟機系統寫入及讀取小於繞射極限的記錄點,並成功地解析200奈米以下的記錄點,初步證實在現今的DVD商用光碟片基板及碟機系統下,可望達到單層單面約15GB的容量目標。 | zh_TW |
dc.description.abstract | Near-field optical disk technology is a new way to achieve ultrahigh density optical recording. Marks smaller than diffraction limit can be recorded and then be readout by conventional pickup head of DVD driver. In this thesis, we study the optical properties and working mechanisms of different types of super-resolution near-field optical disk structures. At first, we successfully fabricate Sb type and AgOx type near-field disk by RF reactive sputtering process. Tunneling electron microscopy (TEM) and scanning electron microscopy (SEM) were used to analyze the nanostructures of these two types of near-field optical disks. Near-field optical properties are also measured by a home-made tapping-mode tuning-fork near-field scanning optical microscope (TMTF-NSOM). We found that there are strong nonlinear optical enhancements of AgOx thin film in the near-field. Localized surface plasmon excitations are found to be the main working mechanism for retrieving the small marks beyond the diffraction limit. Based on the known working mechanism of near-field optical disk, we investigate ZnOx nano-structured thin film as a new type near-field active layer of near-field optical disk. A 30dB carrier to noise ratio (CNR) of 100nm mark train was obtained, and close to 40dB of CNR for 200nm recorded marks can be achieved. A commercial DVD driver has successfully used to demonstrate the readout of small marks of ZnOx type near-field optical disk with signal modulations of 200nm marks. | en |
dc.description.provenance | Made available in DSpace on 2021-06-13T16:30:51Z (GMT). No. of bitstreams: 1 ntu-94-D91222019-1.pdf: 13104017 bytes, checksum: 3ac555cc8c2d5f30ce6154b8325e9110 (MD5) Previous issue date: 2005 | en |
dc.description.tableofcontents | 目錄 I
圖目錄 III 表目錄 VII 1 第一章 前言 1 參考文獻 4 2 第二章 奈米光子學與光儲存技術簡介 5 2-1 近場光學的原理與發展 6 2-1-1 光學繞射現象產生的解析極限問題 6 2-1-2 近場光學顯微術的基本原理 9 2-1-3 近場光學顯微術的發展 16 2-2 奈米尺度內的非線性光學現象 21 2-2-1 金屬邊界的電磁波與物質的交互作用 21 2-2-2 表面電漿子共振(Surface plasmon resonance)簡介 22 2-2-3 侷域表面電漿子共振(Localized surface plasmon resonance) 30 2-3 光儲存技術簡介 34 2-3-1 CD、DVD與藍光光碟技術 36 2-3-2 次世代光儲存技術的發展 43 參考文獻 56 3 第三章 奈米超分辨近場記錄之研究方法與目標 58 3-1 超分辨近場結構的發展與相關文獻回顧 58 3-2 研究目標 62 3-3 實驗儀器與架構 64 3-3-1 射頻濺鍍系統 64 3-3-2 光碟動態測試儀(Dynamic optical tester) 67 3-3-3 石英音叉距離感測式近場光學顯微儀 69 參考文獻 74 4 第四章 奈米超分辨近場記錄之實驗結果與討論 76 4-1 SB超分辨結構層之光學特性研究與機制探討 76 4-1-1 近場光學影像與近場光強梯度量測與分析 78 4-1-2 近場作用層之微結構分析 81 4-1-3 Sb 近場光碟片之超分辨機制探討 83 4-2 AGOX超分辨結構層之光學特性與機制探討 85 4-2-1 AgOx 薄膜之微結構分析 87 4-2-2 AgOx 薄膜之近場光強影像與近場光強梯度分析 90 4-2-3 AgOx超分辨近場結構之動態侷域強度增強效應討論 93 4-2-4 AgOx近場光碟片之動態讀寫特性研究 99 4-2-5 AgOx近場光碟片之超分辨機制探討 103 4-3 ZNOX超分辨結構之光學特性與機制探討 104 4-3-1 ZnOx薄膜之微結構分析 105 4-3-2 ZnOx近場光碟片之動態讀寫特性研究 111 4-3-3 僅寫一次型有機染料近場光碟片研究 122 4-3-4 ZnOx近場光碟片之超分辨機制探討 132 參考文獻 137 5 第五章 結論 140 | |
dc.language.iso | zh-TW | |
dc.title | 奈米超分辨近場記錄之光學研究 | zh_TW |
dc.title | Optical studies of super-resolution near-field nano recording | en |
dc.type | Thesis | |
dc.date.schoolyear | 93-2 | |
dc.description.degree | 博士 | |
dc.contributor.oralexamcommittee | 王威(william Wang),王式禹(Shyh Yeu Wang),曹培熙(Pei-Hsi Tsao),賈至達(Chih-Ta Chia),張瑞麟(Railing Chang),趙遠鳳(Yuan -Fong Chau) | |
dc.subject.keyword | 奈米科技,超高密度光儲存,近場光碟,超分辨,近場光學,表面電漿子, | zh_TW |
dc.subject.keyword | plasmonic,near-field,optical storage,super-resolution,surface plasmon,nano-photonics,photonic transistor,near-field optical disk, | en |
dc.relation.page | 142 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2005-07-12 | |
dc.contributor.author-college | 理學院 | zh_TW |
dc.contributor.author-dept | 物理研究所 | zh_TW |
顯示於系所單位: | 物理學系 |
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