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完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.advisor | 林招松(Chao-Sung Lin) | |
dc.contributor.author | Pei-Cheng Hsu | en |
dc.contributor.author | 許倍誠 | zh_TW |
dc.date.accessioned | 2021-06-13T15:26:38Z | - |
dc.date.available | 2009-07-21 | |
dc.date.copyright | 2008-07-21 | |
dc.date.issued | 2008 | |
dc.date.submitted | 2008-07-17 | |
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dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/37393 | - |
dc.description.abstract | 電鍍是一種古老的鍍層製備工藝,要獲得品質佳的電鍍層必須透過其成長機構透析,觀察工具儼然成為瞭解電鍍層成長機構的關鍵。本論文使用新穎的同步輻射X光顯微術即時觀察電鍍的成長過程。即時X光顯微術可連續檢測成長中的金屬結構,由於它具有足夠的時間解析度來擷取快速的成長過程,及擁有高空間解析度以解析細微的結構。基於X光顯微術的獨特解析能力,本研究分為三個部份,以觀察不同金屬於電鍍時的成長情形,分別為電鍍鋅分歧結構的成長過程,電鍍銅分歧結構的成長過程,以及硼酸對電鍍鎳的影響。
首先,於定電壓與定電流下,探討氫氣泡發展對於鋅分歧結構的影響及其詳細的結構特性。結果顯示,氫氣泡發展程度隨著施以電壓和電流密度增加而增加。特別是分歧結構由緻密狀樹枝結構轉變成蕨類狀樹枝結構,而蕨類狀樹枝結構的形成原因,是因為此結構的成長完全受到氫氣泡的限制。電鍍鋅分歧結構的最後形貌會因定電壓或定電流的不同而改變。 第二部份以不同濃度的硫酸銅與硫酸溶液,及以定電壓和定電流模式探討分枝結構的成長情形。於未添加硫酸的電鍍銅溶液,施以的電壓在極限電流密度區域,銅鍍層不因電鍍時間而改變,自始至終都呈現緻密狀分枝結構。然而在遠超過極限電流密度的條件下,發現銅鍍層形貌隨著時間而轉變,由初始階段的針狀樹枝結構轉變成緻密狀分枝結構。當電鍍銅溶液加入硫酸,分歧結構的分枝變細,而構成高多孔性的鍍層,而氫的吸附扮演著重要的角色。 最後,針對硫酸浴和瓦玆浴探討硼酸對電鍍鎳的影響。未添加硼酸的硫酸浴於低電壓的條件下,電鍍鎳伴隨著強烈的氫氣泡發展,其形成附著性差的鍍鎳層,於電鍍的過程中造成裂紋的成長,而導致鍍層的破裂。在瓦玆浴電鍍鎳過程中,氫氣泡發展較為微弱,可於較高的電壓下製備鍍鎳層。實驗結果顯示,硼酸於電鍍鎳溶液中扮演著抑制氫氣泡發展的角色。 | zh_TW |
dc.description.abstract | Metal electrodeposition is one of the oldest and most established technologies. However, there is a substantial margin for improving the electrodeposits by better understanding its basic mechanism. The observation tool is a quite important role for this objective. In this dissertation, the metal electrodeposition is studied by a novel real-time synchrotron X-ray microradiology. Real-time radiography permits continuous inspection of growth structure, which has sufficient time resolution to capture the fast evolution, adequate lateral resolution to relevant microstructure. There are three parts in this study, including the ramified formation in zinc electrodeposition, the ramified formation in copper electrodeposition, and the effect of boric acid in nickel electrodeposition.
In the first part, it is showed that the effect of hydrogen bubble evolution on zinc ramified growth and detailed zinc ramified feature under potentiostatic and galvanostatic mode. The degree of hydrogen bubble evolution increases with applied potential and current density. In particular, the zinc ramified electrodeposits transit from dense-branching morphology to fern-like dendrite, it is because that the fern-like dendrite completely forms by constricting of hydrogen bubbles. The end of morphology is entirely different between potentiostatic and galvanostatic mode. In the second part, it is systematically investigated that the ramified structure of deposits plated from various concentrations of copper sulfate and sulfuric acid. In the sulfuric acid-free solution, the copper electrodeposits appear consistent in dense-branching morphology at the applied potential in the vicinity of limiting current density. In particular, the morphology transition from needle-like dendrite to dense-branching is observed at the applied potential far above limiting current density. The detail transition process is discussed in this study. When the sulfuric acid is added to the plating solution, the highly porous ramified structure constructed from thin-branching morphology is created in the deposition. Last part, the effect of boric acid on the growth of nickel deposits from sulfate bath and Watts bath is demonstrated. From boric acid-free of sulfate bath, the nickel deposition accompanied with very strong hydrogen bubble evolution, causing the interior of nickel deposits, crack formation and fracture during deposition. In the Watts bath, the hydrogen bubble evolution became very weak during nickel deposition. The deposition can perform at higher applied potential. | en |
dc.description.provenance | Made available in DSpace on 2021-06-13T15:26:38Z (GMT). No. of bitstreams: 1 ntu-97-D92527012-1.pdf: 16751752 bytes, checksum: bcf69a90e9a076d59825ace6568b2899 (MD5) Previous issue date: 2008 | en |
dc.description.tableofcontents | Acknowledgements II
摘要 IV Abstract VI List of Figures XI List of Tables XVII Chapter 1 General Introduction 1 1.1 Background and Motivation 1 1.2 Overview of the thesis 5 Chapter 2 Literature review 6 2.1 Analysis and characterization tool for metal electrodeposits 6 2.1.1 Ex-situ method 6 2.1.2 In-situ method 6 2.2 The growth of ramified electrodeposits 9 2.2.1 Cathodic polarization curve and limiting current 9 2.2.2 Former work on the formation of ramified electrodeposits 11 2.2.3 Recent work on the formation of ramified electrodeposits 12 2.2.3.1 Diffusion-limited-aggregation 12 2.2.3.2 Pattern growth in the electrodeposition 14 2.2.3.3 The model of dendrite formation in two-dimensional cell 15 2.2.3.4 The effect of electro-convection on ramified growth 16 Chapter 3 Phase contrast X-ray image and imaging instrumentation 22 3.1 Coherent X-rays from synchrotron sources [17,72] 22 3.2 Mechanisms of coherent X-ray imaging [16] 27 3.3 X-ray imaging instrument 32 3.3.1 The X-ray source 32 3.3.2 Beamline layout 34 3.4 The radiography system in the experimental hutch [80,81] 35 Chapter 4 The growth of zinc ramified structure 39 4.1 Introduction 39 4.2 Experimental detail 42 4.2.1 Solution composition and operation condition 42 4.2.2 The electrochemical cell design and electrode preparation 42 4.2.3 Electric field analysis 43 4.2.4 Electrochemical analysis 44 4.2.5 In-situ X-ray imaging 44 4.2.6 Ex-situ zinc electrodeposits characterization 47 4.3 Results and discussion 47 4.3.1 Cathodic polarization curve 47 4.3.2 Galvanostatic deposition 50 4.3.2.1 Far below limiting current density region 50 4.3.3.2 Limiting current density region 54 4.3.2.3 Far from limiting current density region 55 4.3.3 Potentiostatic deposition 59 4.3.3.1 Far below limiting current density region 59 4.3.3.2 Limiting current density region 59 4.3.3.3 Far above limiting current density region 65 4.3.4 Hydrogen evolution 72 4.5 Conclusions 79 Chapter 5 The growth of copper ramified structure 81 5.1 Introduction 81 5.2 Experiment detail 83 5.2.1 Solution composition and operation condition 83 5.2.2 The electrochemical cell design and electrode preparation 84 5.2.3 Electrochemical analysis 84 5.2.4 X-ray imaging 85 5.3 Results and discussion 85 5.3.1 Copper ramified growth on micro-pattern 85 5.3.2 The effect of copper sulfate concentration on the formation of ramified structure 87 5.3.2.1 Cathodic polarization curve 87 5.3.2.2 Potentiostatic deposition 87 5.3.2.2.1 Ramified precursor 89 5.3.2.3.2 Evolution of copper ramified morphology 90 5.3.2.3 Galvanostatic deposition 104 5.3.3 The effect of sulfuric acid on the formation of ramified structure 107 5.3.3.1 The cathodic polarization curve 107 5.3.3.2 Potentiostatic deposition 111 5.4 Conclusions 126 Chapter 6 Boric acid effect in nickel electrodeposition 129 6.1 Introduction 129 6.2 Experimental detail 132 6.2.1 Solution composition and operation condition 132 6.2.2 The electrochemical cell design and electrode preparation 132 6.2.3 Electrochemical analysis 133 6.2.4 In-situ X-ray imaging 134 6.3 Results 135 6.3.1 Cathodic polarization curve 135 6.3.2 In-situ X-ray microradiology observations 137 6.4 Conclusion 149 Chapter 7 Conclusion and Outlook 150 References 152 | |
dc.language.iso | en | |
dc.title | 以相干性X光顯微術即時觀察金屬電鍍層的成長 | zh_TW |
dc.title | In-Situ Observation of Coherent Microradiology in Metal Electrodeposits Growth | en |
dc.type | Thesis | |
dc.date.schoolyear | 96-2 | |
dc.description.degree | 博士 | |
dc.contributor.coadvisor | 胡宇光(Yeukuang Hwu) | |
dc.contributor.oralexamcommittee | 陳俊維(Chun-Wei Chen),林鴻明(Hong-Ming Lin),張六文(Liu-Wen Chang) | |
dc.subject.keyword | 同步輻射X光顯微術,極限電流密度,緻密狀分枝結構,針狀樹枝結構,氫氣泡發展,蕨類狀樹枝結構, | zh_TW |
dc.subject.keyword | synchrotron X-ray microradiology,limiting current density,dense-branching, needle-like dendrite,hydrogen bubble evolution,fern-like dendrite, | en |
dc.relation.page | 165 | |
dc.rights.note | 有償授權 | |
dc.date.accepted | 2008-07-18 | |
dc.contributor.author-college | 工學院 | zh_TW |
dc.contributor.author-dept | 材料科學與工程學研究所 | zh_TW |
顯示於系所單位: | 材料科學與工程學系 |
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