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| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.advisor | 劉致為(Chee Wee Liu) | |
| dc.contributor.author | Cheng-Ting Lee | en |
| dc.contributor.author | 李政霆 | zh_TW |
| dc.date.accessioned | 2021-06-08T06:08:58Z | - |
| dc.date.copyright | 2007-07-24 | |
| dc.date.issued | 2007 | |
| dc.date.submitted | 2007-07-17 | |
| dc.identifier.citation | Ch1
[1] T. L. Worchesky, K. J. Ritter, R. Martin, and B. Lane, Appl. Opt., 35, 1180 (1996). [2] K. W. Goossen, J. A. Walker, L. A. D’ Asaro, S. P. Hui, B. Tseng, R. Leibenguth, D. Kossives, D. D. Bacon, D. Dahringer, L. M. F. Chirovsky, A. L. Lentine, and D. A. B. Miller, IEEE Photon. Technol. Lett., 7, 360 (1995). [3] A. V. Krishnamoorthy, L. M. F. Chirovsky, W. S. Hobson, R. E. Leibenguth, S. P. Hui, C. J. Zydzik, K. W. Goossen, J. D. Wynn, B. J. Tseng, J. Lopata, J. A. Walker, J. E. Cunningham, and L. A. D’Asaro, IEEE Photon. Technol. Lett., 11, 128 (1999). [4] R. Bockstaele, T. Coosemans, C. Sys, L. Vanwassenhove, A. Van Hove, B. Dhoedt, I. Moerman, P. Van Daele, R. G. Baets, R. Annen, H. Melchior, J. Hall, P. L. Heremans, M. Brunfaut, and J. Van Campenhout, IEEE J. Sel. Top. Quantum Electron., 5, 224 (1999). [5] H. Rong, R. Jones, A. Liu, O. Cohen, D. Hak, A. Fang, and M. Paniccia, Nature, vol. 433, pp. 725–728, Feb. 2005. [6] P. M. Fauchet, Mater. Today, vol. 8, no. 1, pp. 26–31, Jan. 2005. [7] S. J. McNab, N. Moll, and Yu. A. Vlasov, Opt.Express, vol. 11, no. 22, pp. 2927–2939, Nov. 2003. [8] A. Liu, R. Jones, L. Liao, D. Samara-Rubio, D. Rubin, O. Cohen, R. Nicolaescu, and M. Paniccia, Nature, vol. 427, no. 6975,pp. 615–618, Feb. 2004. [9] Q. F. Xu, B. Schmidt, S. Pradhan, and M. Lipson, Nature, vol. 435, no. 7040, pp. 325–327, May 2005. [10] M. R. Reshotko, D. L. Kencke, and B. Block, Proc. SPIE, Oct. 2004, vol. 5564, pp. 146–155. [11] S. J. Koester, J. D. Schaub, G. Dehlinger, J. O. Chu, Q. C. Ouyang, and A. Grill, Proc. Device Research Conf, Notre Dame, IN, 2004, pp. 175–176. Ch2 [1] C. W. Liu, M. H. Lee, M.-J. Chen, I. C. Chen, and C.-F. Lin, Appl. Phys. Lett, 76, 1516 (2000). [2] M. H. Liao, C.-Y. Yu, T.-H. Guo, C.-H. Lin, S. T. Chang, C.-T. Chai, and C. W. Liu, IEEE Electron Device Letter, 27, 252 (2006). [3] M. H. Liao, C.-Y. Yu, C.-F. Huang, C.-H. Lin, C.-J. Lee, M.-H. Yu, S. T. Chang, C.-Y. Liang, C.-Y. Lee, T.-H. Guo, C.-C. Chang, and C. W. Liu, 51th International Electron Device Meeting (IEDM), Washington D.C., 1023 (2005). [4] X. Xiao, C. W. Liu, J. C. Sturm, L. C. Lenchyshyn, and M. L. Thewalt, Appl. Phys. Lett. 60, p.1720 (1992). [5] C. W. Liu, J. C. Sturm, Y. R. J. Lacroix, M. L. Thewalt, and D. D. Perovic, Appl. Phys. Lett. 65, p.76 (1994). [6] D. J. Robbins, P. Calcott, and W. Y. Leong, Appl. Phys. Lett. 59, p.1350 (1991). [7] S. M. Sze, Physics of Semiconductor Devices, 2nd ed. Wiley, New York, 1981, p. 15. [8] C. W. Liu, M.-J. Chen, I. C. Chen, M. H. Lee, and C.-F. Lin, Appl. Phys. Lett. 77, p. 1111 (2000). [9] http://www.ioffe. rssi. ru/SVA/NSM/Semicond/ [10] Werner Weber, Phys. Rev. B 15, 4789 (1997). Ch3 [1] C. Tserbak, H. M. Polatoglou, and G. Theodorou, Phys. Rev. B 47, 7104 (1993). [2] C. G. Van de Walle, Phys. Rev. B 34, 5621 (1986). [3] M. H. Liao, M.-J. Chen, T. C. Chen, P.-L. Wang, and C. W. Liu, Appl. Phys. Lett. 86, 223502 2005. [4] C. W. Liu, S. Maikap, and C.-Y. Yu, IEEE Circuits Devices Mag. 21, 21 2005. [5] M. Fritze, C. L. Chen, S. Calawa, D. Yost, B. Wheeler, P. Wyatt, C. L. Keast, J. Snyder, and J. Larson, IEEE Electron Device Lett. 25, 220 2004. [6] Y. Hida, T. Tamagawa, H. Ueba, and C. Tatsuyama, J. Appl. Phys. 67,7274 1990. [7] Properties of Crystalline Silicon, EMIS Data Reviews Series No. 20,edited by R. Hull INSPEC, London, 1999. [8] M. H. Liao, M.-J. Chen, T. C. Chen, P.-L. Wang, and C. W. Liu, Appl. Phys. Lett, 86, 223502 (2005) [9] C. G. Van de Walle, Phys. Rev. B 39, 1871 (1989). Ch4 [1] C. W. Liu, W. T. Liu, M. H. Lee, W. S. Kuo, and B. C. Hsu, IEEE Electron Dev. Lett., 21, 307 (2000). [2] B.-C. Hsu, W.-C. Hua, and C.-R. Shie, K.-F. Chen, and C. W. Liu, J. Electrochem. Soc., 6, 9 (2003). [3] M. J. Chen, C. F. Lin, M. H. Lee, S. T. Chang, and C. W. Liu, Appl. Phys. Lett. 79, 2264 (2001). | |
| dc.identifier.uri | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/25321 | - |
| dc.description.abstract | 本論文中,我們報告了從鍺金氧半二極體所發出的紅外光的特性,並且觀察到接近1.8微米的發光波長。我們也使用了電子-電洞-電漿模型來分析發光頻譜,得到了頻譜的理論線以及能隙的理論值。鍺的發光強度比矽強,可能的原因是鍺有較高的發光複合效率以及需要較少的晶格動量來達成複合發光時的動量守恆。為了了解不同的閘極金屬材料對鍺金氧半發光元件的影響,我們研究了鋁閘極和鉑閘極元件的特性。在同樣的操作電流下,鋁閘極元件的光強度比鉑閘極元件強。
我們也研究了應變鍺金氧半發光元件的發光特性,藉著使用外加應變的機械裝置,我們在鍺金氧半發光元件上施加了雙軸應變以及單軸應變。由於應變使得鍺的能隙變小,進而使得發光頻譜有紅位移的現象發生,而雙軸應變所造成的能隙減少較單軸應變多。 最後,我們使用鍺金氧半二極體在空氣中傳送光信號。藉由不同的操作原理,鍺金氧半二極體可以發射或偵測光子。而資料傳輸的速度可以達到15百萬赫茲或更快。 | zh_TW |
| dc.description.abstract | In this thesis, we present the infrared emission from Ge metal-oxide-semiconductor (MOS) tunneling diodes. The peak emission wavelength of ~1.8μm is observed. The electron-hole-plasma model is then used to get the fitting line of the emission spectra and the theoretical band gap energy values. It is observed that the emission light intensity of Ge is stronger than Si, where possible reasons may be the higher radiative recombination rate and the slightly smaller wave vector needed to conserve momentum in Ge. To understand the influences of different metal gate materials on the performance of Ge MOS light-emitting device (LED), the characteristics of Al and Pt gate devices are investigated. Al gate devices have stronger emission than Pt gate devices under the same injection current operation.
The emission properties of strained-Ge MOS LED are also investigated. Using the external strain mechanism, we apply biaxial and uniaxial strain on the Ge MOS LED. The emission wavelength of strained-Ge MOS LED is redshifted due to the band gap reduction, and biaxial strain can give more band gap reduction than uniaxial strain. Finally, we transfer optical signals between Ge MOS tunneling diodes in free space. The Ge MOS tunneling structure can emit and detect photons through different operation principles. The transmission rate can reach 15MHz or higher. | en |
| dc.description.provenance | Made available in DSpace on 2021-06-08T06:08:58Z (GMT). No. of bitstreams: 1 ntu-96-R94943120-1.pdf: 2084049 bytes, checksum: fe2b572d4f662a1df63b39693e0186e3 (MD5) Previous issue date: 2007 | en |
| dc.description.tableofcontents | Contents
List of Figures V List of Tables VII Chapter 1 Introduction 1.1 Motivation 1 1.2 Organization 2 References 3 Chapter 2 Infrared Emission from Ge MOS Tunneling Diodes 2.1 Introduction 5 2.2 Device Fabrication 6 2.3 Experimental Setup 8 2.4 Infrared Emission fron Ge MOS Tunneling Diodes 11 2.4.1 Operation Principles 11 2.4.2 Electroluminescence of Ge MOS tunneling diodes 14 2.4.3 Electron-Hole-Plasma Model 16 2.4.4 Fitting the EL Spectra by Electron-Hole-Plasma Model 21 2.5 Compare with Si MOS Tunneling Diodes 26 2.6 Influences of Different Metal Gate Materials 28 2.7 Summary 35 References 36 Chapter 3 Ge MOS Tunneling Diodes with Mechanical Strain 3.1 Introduction 37 3.2 Experiment Setup 39 3.3 Raman Analysis 41 3.4 Results and Discussion 44 3.5 Summary 46 References 47 Chapter 4 Data Communications between Ge MOS Tunneling Diodes 4.1 Introduction 48 4.2 Device Fabrication and Experimental Setup 49 4.3 Operation Principles of Ge MOS Photodetector 50 4.4 Results and Discussion 53 4.5 Summary 58 References 58 Chapter 5 Summary and Future Work 5.1 Summary 59 5.2 Future Work 60 | |
| dc.language.iso | en | |
| dc.subject | strain | en |
| dc.subject | LED | en |
| dc.subject | light-emtting device | en |
| dc.subject | MOS | en |
| dc.subject | germanium | en |
| dc.subject | Ge | en |
| dc.title | 鍺金氧半發光元件 | zh_TW |
| dc.title | Germanium Metal-Oxide-Semiconductor Light-Emitting Device | en |
| dc.type | Thesis | |
| dc.date.schoolyear | 95-2 | |
| dc.description.degree | 碩士 | |
| dc.contributor.oralexamcommittee | 倪衛新,黃英碩,汪大暉,林鴻志 | |
| dc.subject.keyword | 發光二極體,金氧半,鍺,應變, | zh_TW |
| dc.subject.keyword | LED,light-emtting device,MOS,germanium,Ge,strain, | en |
| dc.relation.page | 60 | |
| dc.rights.note | 未授權 | |
| dc.date.accepted | 2007-07-17 | |
| dc.contributor.author-college | 電機資訊學院 | zh_TW |
| dc.contributor.author-dept | 電子工程學研究所 | zh_TW |
| 顯示於系所單位: | 電子工程學研究所 | |
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| ntu-96-1.pdf 未授權公開取用 | 2.04 MB | Adobe PDF |
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