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標題: | 菲涅爾波帶片應用於奈米微影製程 A Nano Lithography Process based upon Fresnel Zone Plate |
作者: | Ting-Hsuan Chiu 邱庭軒 |
指導教授: | 顏家鈺 |
關鍵字: | 極紫外光,菲涅爾波帶片,直寫式奈米微影,反射片,反射率,電子束微影, extreme ultraviolet (EUV),Fresnel zone plate (FZP),direct-write nanometer lithography,reflector,reflectivity,E-beam lithography, |
出版年 : | 2011 |
學位: | 碩士 |
摘要: | 由於積體電路的快速發展,微影製程所需的線寬愈來愈小,極紫外光微影被視為次世代微影中極具潛力的方法之一,而對於短波長的聚焦無法使用一般的折射原理,必須改用繞射光學元件,其中菲涅爾波帶片是可實現的元件。
本論文以製作出菲涅爾波帶片為基礎並驗證其可應用於直寫式奈米微影系統為目的,對於此方式之微影製程,安裝於快門機構上之反射片亦是一項重要之元件,而一般用於短波長之反射片通常需要兩種以上材料且週期數高之多層膜才能達到高反射率,造成此元件之製程非常複雜,因此本論文提出以增加入射角度來提高反射率之理論,進而有效降低其週期且簡化製程之困難度。 本研究方法以藍光為光源進行反射片實驗及微影實驗;在反射片實驗中,利用馬達控制反射片,產生不同的入射角量測其穿透率,結果證實反射率隨入射角度增加而提高。微影實驗則以電子束微影結合濕蝕刻等製程製作出菲涅爾波帶片,利用自行開發之精密微影系統驗證涅爾波帶片具有繞射效應,實驗結果顯示,透過波帶片繞射後,於理論焦距處所得到微影之結果恰為實驗中之最小線寬30 μm。 The line width of integrated circuits is getting much and much smaller due to the fast progress which has been made in IC technology. Extreme ultraviolet lithography (EUVL) is considered one of the next generation lithography technologies which have the most powerful potential. The extremely short wavelength (13.5nm) of EUVL makes it impossible to optically focus by applying traditional refraction principle. Instead, one has to adopt diffraction components, among which Fresnel Zone Plate (FZP) is most likely to be feasible. This thesis aimed at designing a FZP and verifying that it could be apply into a direct-write nanometer lithography system. Besides, the reflector which is installed on shutter is a critical component as well. Generally speaking, the fabricating process of this short wavelength reflector is very sophisticated since it includes at least two metal materials and a long-period, multi-layer coating in order to get high reflectivity. Hence, this study also came up with a conclusion of increasing reflectivity by increasing the angle of incidence, which led to the simplication of process and the shortening of period. This study chose a blue ray laser with 437 nm wavelength and 200 mW power as the light source for both experiments of lithography and reflectivity. In the experiment of reflectivity, the reflector was driven by a step motor to vary the angle of incidence. While in the lithography experiment, a homemade lithography system was utilized to verify that a FZP made by electron beam lithography and wet etching process has diffractive nature. The results concluded that the minimum line width (30 μm) at the focal point obtained from this experiment is identical to the theoretical one. |
URI: | http://tdr.lib.ntu.edu.tw/jspui/handle/123456789/24722 |
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顯示於系所單位: | 機械工程學系 |
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